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Single wafer plasma CVD equipment CMD series-CMD-450BHT
Single wafer plasma CVD equipment CMD series-ULVAC Sales Co., Ltd.

Single wafer plasma CVD equipment CMD series
ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

125.8hours


About This Product

■Summary

The CMD series is a single-wafer CVD system for forming a-Si films, silicon oxide films, and nitride films using SiH4 and TEOS.

■Applications

Low temperature P-Si, α-Si TFT

■Features

・We have realized a stable transfer system by developing a drive system for each unit and a vacuum transfer robot that can operate at higher temperatures than conventional process temperatures. ・By improving the internal structure of the reaction chamber and the gas supply system, it is possible to obtain a stable rate of TEOS (SiO2) film over the long term. ・By heating the reaction gas path, it is possible to exhaust the gas to the excluded equipment, and by not using piping traps, it is possible to suppress the adhesion of by-products to piping, etc., and shorten maintenance time. ・Easy to manage individual substrates such as film forming conditions.

  • Product

    Single wafer plasma CVD equipment CMD series

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1 Models of Single wafer plasma CVD equipment CMD series

Image Part Number Price (excluding tax) Vacuum exhaust system Loading and unloading chamber Reaction chamber Production amount Transfer room Board transfer machine Board size (mm) Reaction chamber Heating chamber Loading and unloading room
Single wafer plasma CVD equipment CMD series-Part Number-CMD-450BHT

CMD-450BHT

Available upon quote

Rotary + mekabu
Dry + mekabu

65 seconds/piece
(Our standard condition SiN 300nm single layer)

1 room (heptagonal)

Option

400×500×t0.7

4 rooms (3 rooms if there is an annealing room)

1 room

2 rooms

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About Company Handling This Product

Response Rate

100.0%


Response Time

125.8hrs

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