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  3. Plasma-Enhanced CVD
  4. Single wafer PE-CVD equipment CME-200E/400 (ULVAC Sales Co., Ltd.)
Single wafer PE-CVD equipment CME-200E/400-CME-200E/400
Single wafer PE-CVD equipment CME-200E/400-ULVAC Sales Co., Ltd.

Single wafer PE-CVD equipment CME-200E/400
ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

125.8hours

About This Product

■Summary

Single wafer PE-CVD equipment CME-200E/400 is a PE-CVD equipment for mass production that is ideal for forming silicon-based insulating films, barrier films, etc.

■Applications

・Power device ・LED, LD, high speed device ・Organic EL ・Solar cells ・MEMS

■Features

・27.12MHz high-density plasma process ・SiH4 type: SiO2, SiNx, SiON, a-Si, TEOS type: SiO2 film available ・Chamber cleaning possible with NF3+Ar plasma ・Can be equipped with a heater for low-temperature film formation for organic EL ・Supports board sizes up to □200mm (CME-200E) with tray transport (Supports CME-400: 300×400)

  • Product

    Single wafer PE-CVD equipment CME-200E/400

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1 Models of Single wafer PE-CVD equipment CME-200E/400

Image Part Number Price (excluding tax)
Single wafer PE-CVD equipment CME-200E/400-Part Number-CME-200E/400

CME-200E/400

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About Company Handling This Product

ULVAC Sales Co., Ltd.

Response Rate

100.0%

Response Time

125.8hrs

  • Japan

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