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  3. Plasma-Enhanced CVD
  4. Load-lock plasma CVD equipment CC-200/400 (ULVAC Sales Co., Ltd.)
Load-lock plasma CVD equipment CC-200/400-CC-200/400
Load-lock plasma CVD equipment CC-200/400-ULVAC Sales Co., Ltd.

Load-lock plasma CVD equipment CC-200/400
ULVAC Sales Co., Ltd.

About This Product

■Summary

The CC-200/400 load-lock plasma CVD equipment is small and easy to use, and is suitable for everything from research and development to production.

■Applications

・Power device ・Compound related to LED, LD, high-speed devices, etc. ・Organic EL development ・Solar cell development ・MEMS

■Features

・27.12MHz high-density plasma process ・SiH4 type: SiO2, SiNx, SiON, a-Si, TEOS type: SiO2 film available ・Chamber cleaning possible with CF4+O2 plasma ・Can be used as a heater for low-temperature film formation for organic EL ・Supports various board sizes with tray transportation ・Indirect continuous process between C series is possible using a vacuum box (Sputter: CS-200, Evaporation: CV-200)

  • Product

    Load-lock plasma CVD equipment CC-200/400

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1 Models of Load-lock plasma CVD equipment CC-200/400

Image Part Number Price (excluding tax)
Load-lock plasma CVD equipment CC-200/400-Part Number-CC-200/400

CC-200/400

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About Company Handling This Product

ULVAC Sales Co., Ltd.

  • Japan

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