Source Ultra-high vacuum compatible magnetron
Kitano Seiki Co., Ltd.
About This Product
■Summary
This sputter source is a general-purpose compact magnetron sputter source that is compatible with ultra-high vacuum. Since the main body is entirely bakeable, it is possible to form films with few impurities even with highly reactive targets.
■Features
・Ultra-high vacuum type that does not use O-rings
・The magnet can be removed while keeping the sputtering source in ultra-high vacuum.
・By removing the magnet, baking up to 300℃ is possible.
・The target is fixed with a retainer, allowing the target to be replaced in a short time.
・As the gas inlet is integrated with the mounting flange, no flange is required for gas introduction.
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Product
Source Ultra-high vacuum compatible magnetron
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Handling Company
Kitano Seiki Co., Ltd.
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Categories
1 Models of Source Ultra-high vacuum compatible magnetron
| Product Image | Part Number | Price (excluding tax) | Baking temperature | Fixed target | Magnet material | Mounting flange | Target size |
|---|---|---|---|---|---|---|---|
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DC sputter source |
Available upon quote | 300℃ | Retainer type | SmCo | ICF-152 | 1.5inch (circular) |
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About Company Handling This Product
- Japan