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  3. Sputtering Equipment
  4. Source Ultra-high vacuum compatible magnetron (Kitano Seiki Co., Ltd.)
Source Ultra-high vacuum compatible magnetron-DC sputter source
Source Ultra-high vacuum compatible magnetron-Kitano Seiki Co., Ltd.

Source Ultra-high vacuum compatible magnetron
Kitano Seiki Co., Ltd.

About This Product

■Summary

This sputter source is a general-purpose compact magnetron sputter source that is compatible with ultra-high vacuum. Since the main body is entirely bakeable, it is possible to form films with few impurities even with highly reactive targets.

■Features

・Ultra-high vacuum type that does not use O-rings ・The magnet can be removed while keeping the sputtering source in ultra-high vacuum. ・By removing the magnet, baking up to 300℃ is possible. ・The target is fixed with a retainer, allowing the target to be replaced in a short time. ・As the gas inlet is integrated with the mounting flange, no flange is required for gas introduction.

  • Product

    Source Ultra-high vacuum compatible magnetron

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1 Models of Source Ultra-high vacuum compatible magnetron

Image Part Number Price (excluding tax) Mounting flange Magnet material Baking temperature Fixed target Target size
Source Ultra-high vacuum compatible magnetron-Part Number-DC sputter source

DC sputter source

Available upon quote

ICF-152

SmCo

300℃

Retainer type

1.5inch (circular)

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About Company Handling This Product

Kitano Seiki Co., Ltd.

  • Japan

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