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  4. Hot wire method diamond synthesis equipment (Kitano Seiki Co., Ltd.)
Hot wire method diamond synthesis equipment-Diamond synthesis equipment
Hot wire method diamond synthesis equipment-Kitano Seiki Co., Ltd.

Hot wire method diamond synthesis equipment
Kitano Seiki Co., Ltd.

Kitano Seiki Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

50.9hours

About This Product

■Features

This device is a hot wire type CVD device that uses a tungsten filament, and has the characteristics of large area and high purity thin film formation without plasma damage, and is suitable for P/N semiconductor diamond synthesis and electronic devices such as crystalline silicon solar cells. It is widely used in the field. This device has a split chamber structure that allows for easy maintenance and changes to hardware conditions, and the line-configured operation panel has the operating parts including the gas line concentrated on the front, making it easy to operate. .

■Configuration

・φ600 high vacuum water cooling chamber ・TMP&RP exhaust unit ・Chamber lifting mechanism ・Gas mixing panel (IN4 system OUT2 system) ・Bubbler constant temperature layer

  • Product

    Hot wire method diamond synthesis equipment

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1 Models of Hot wire method diamond synthesis equipment

Image Part Number Price (excluding tax) Sample size Substrate heating temperature Ultimate vacuum Hot wire Heater power Gas line TC monitor
Hot wire method diamond synthesis equipment-Part Number-Diamond synthesis equipment

Diamond synthesis equipment

Available upon quote

100mm

Max800℃

≦1.0E-5Pa

Φ0.6 tungsten

AC/DC35kW

2 mixed systems

6 points

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About Company Handling This Product

Kitano Seiki Co., Ltd.

Response Rate

100.0%

Response Time

50.9hrs

  • Japan

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