All Categories
History
Relatively Fast Response
Product
Sputtering equipment RFS-201Handling Company
Sanko Ematech Co., Ltd.Categories
Image | Part Number | Price (excluding tax) | Ionization vacuum gauge | Mass (kg) | Auxiliary pump | Auxiliary valve | Automatic leak valve | Film thickness distribution | Vacuum layer | Liquid nitrogen trap | Effective film formation range | Maximum dimension (mm) | Operation | Exhaust time | Deposition speed (mm) | Recommended board size | Substrate heating temperature | Substrate/electrode distance | Ultimate pressure (kPa) Gauge pressure notation | Ultimate pressure (Pa) Absolute pressure notation | Manufacturer | Main pump | Main valve | Pirani vacuum gauge | Cathode | Oil mist trap | RF power supply |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
RFS-201 |
Available upon quote |
Option |
260 |
Oil rotary vacuum pump 100L/min |
Three way valve |
Option |
With SiO2 film formation, within 50mm area ±8% |
Metal chamber (200mm (W) ×250mm (D) ×150mm (H) ) |
Option |
50mm |
764 (W) × 723 (L) × 1,648 (H) |
Manual |
6.6×10-3Pa/5min |
20nm/min or more in SiO2 film formation |
Φ80mm×t1-5mm |
Max 350℃ |
30~50mm (variable) |
-101.3 |
6.6×10-4 |
ULVAC Kiko Co., Ltd. |
Oil diffusion pump (water cooling) 150L/sec |
Clapper valve |
G-TRAN |
Φ80mm, 1 yuan |
OMT-100A |
Max 300W (0~300W variable) |
Reviews shown here are reviews of companies.
Reviews shown here are reviews of companies.
Response Rate
100.0%
Response Time
30.9hrs
Company Review
5.0