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Sputtering equipment RFS-201-RFS-201
Sputtering equipment RFS-201-Sanko Ematech Co., Ltd.

Sputtering equipment RFS-201
Sanko Ematech Co., Ltd.

Sanko Ematech Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

30.9hours

Relatively Fast Response


About This Product

Product Description This is a compact high frequency sputtering device that can be used in a space-saving manner. It is possible to form films of metals, semiconductors, and insulators, making it ideal for experiments such as research and development. It is also equipped with an RF power supply.

■Features

・Single layer film formation can be performed with Φ80mm x 1 cathode. ・A sputtering speed of 20nm/min (SiO2) can be achieved using conventional sputtering. ・The main pump uses an oil diffusion pump. ・Compact high-frequency sputtering equipment for insulators, metals, and semiconductor materials ・Compact high-frequency sputtering equipment for insulators, metals, and semiconductor materials ・Because it is small, it can be used in a space-saving manner.

  • Product

    Sputtering equipment RFS-201

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1 Models of Sputtering equipment RFS-201

Image Part Number Price (excluding tax) Ionization vacuum gauge Mass (kg) Auxiliary pump Auxiliary valve Automatic leak valve Film thickness distribution Vacuum layer Liquid nitrogen trap Effective film formation range Maximum dimension (mm) Operation Exhaust time Deposition speed (mm) Recommended board size Substrate heating temperature Substrate/electrode distance Ultimate pressure (kPa) Gauge pressure notation Ultimate pressure (Pa) Absolute pressure notation Manufacturer Main pump Main valve Pirani vacuum gauge Cathode Oil mist trap RF power supply
Sputtering equipment RFS-201-Part Number-RFS-201

RFS-201

Available upon quote

Option

260

Oil rotary vacuum pump 100L/min

Three way valve

Option

With SiO2 film formation, within 50mm area ±8%

Metal chamber (200mm (W) ×250mm (D) ×150mm (H) )

Option

50mm

764 (W) × 723 (L) × 1,648 (H)

Manual

6.6×10-3Pa/5min

20nm/min or more in SiO2 film formation

Φ80mm×t1-5mm

Max 350℃

30~50mm (variable)

-101.3

6.6×10-4

ULVAC Kiko Co., Ltd.

Oil diffusion pump (water cooling) 150L/sec

Clapper valve

G-TRAN

Φ80mm, 1 yuan

OMT-100A

Max 300W (0~300W variable)

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About Company Handling This Product

Response Rate

100.0%


Response Time

30.9hrs


Company Review

5.0
  • Japan

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