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Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 seriesHandling Company
Sanko Ematech Co., Ltd.Categories
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Image | Part Number | Price (excluding tax) | High frequency power supply | Power supply | Interelectrode distance | Weight | Installation area | Auxiliary pump | Film thickness distribution | Forming film | Number of boards installed | Board size | Compressed air | Number of revolutions | Ultimate pressure Load lock chamber | Ultimate pressure Sputtering chamber | Cooling water temperature | Cooling water running water | Cooling water pressure | Main pump | Manufacturer | Pump exhaust allowable exhaust port pressure | N2 gas for pump leak | Heater | N2 gas for chamber leak | Target holder | Ar gas for sputtering | Sputter method | Gas introduction system | Earth | Ultimate pressure | Option |
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HSR-351 |
Available upon quote |
13.6MHz 200W |
AC200V, 3Φ, 60Hz, 5KVA |
70~110mm |
480Kg |
W1,930mm×D1,100mm×H1,650mm |
Oil rotary vacuum pump (RP) |
When rotating ⇒ Φ100mm area ±5%, when stationary ⇒ Φ40mm area ±10% |
Metals, insulators, etc. |
1 piece |
When rotating ⇒ Φ150mm, when stationary ⇒ Φ50mm |
0.4~0.5MPa・G |
MAX20rpm |
- | - |
5~25℃ |
6L/min |
0.2~0.3MPa・G |
Oil diffusion vacuum pump (DP) |
Shimadzu Industrial Equipment Systems Co., Ltd. |
20kPa・G or less |
0.02MPa・G (air is also possible) |
MAX300℃ (substrate surface) |
0.1~0.2MPa・G (air is also possible) |
2 inch 3 units |
0.1~0.2MPa・G |
Depot up |
Ar-mass flow controller (MFC) 1 system |
A type |
10-4Pa level |
Oil mist trap, liquid nitrogen trap, reverse sputtering mechanism |
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HSR-351L (with load lock) |
Available upon quote |
13.6MHz 200W |
AC200V, 3Φ, 60Hz, 5KVA |
70~110mm |
500Kg |
W2,800mm×D1,100mm×H1,650mm |
Oil rotary vacuum pump (RP) |
When rotating ⇒ Φ100mm area ±5%, when stationary ⇒ Φ40mm area ±10% |
Metals, insulators, etc. |
1 piece |
When rotating ⇒ Φ150mm, when stationary ⇒ Φ50mm |
0.4~0.5MPa・G |
MAX20rpm |
6.7Pa |
10-4Pa level |
5~25℃ |
6L/min |
0.2~0.3MPa・G |
Oil diffusion vacuum pump (DP) |
Shimadzu Industrial Equipment Systems Co., Ltd. |
20kPa・G or less |
0.02MPa・G (air is also possible) |
MAX300℃ (substrate surface) |
0.1~0.2MPa・G (air is also possible) |
2 inch 3 units |
0.1~0.2MPa・G |
Depot up |
Ar-mass flow controller (MFC) 1 system |
A type |
- |
Oil mist trap, liquid nitrogen trap, reverse sputtering mechanism |
Click on the part number for more information about each product
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