Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series
Sanko Ematech Co., Ltd.
About This Product
■Product description
It is an ideal device for research and development purposes at universities, research institutes, etc. It is also ideal for high-mix, low-volume production.
Device status and various parameters can be set and checked on the touch panel, improving visibility and operability. Operability: Semi-automatic function ⇒ A series of investigations from loading and unloading the board from the load lock chamber is easy. Film-forming auxiliary function ⇒・Automatically operates discharge stop and gas valve closing after sputtering based on film-forming time parameters. Sputter processing time can be set in advance, reducing unnecessary costs caused by forgetting to turn off the discharge or forgetting to close the gas valve even if the operator is not always present.
Safety: Interlock prevents erroneous operation, alarm function ensures safety, abnormality handling details are displayed to support recovery work, abnormality history records the date and time of occurrence.Maintenance: Efficient maintenance is performed according to the user's device operating status. Maintenance parameters are provided so that you can set them as you like.
■Features
・It is a high-performance, easy-to-use product at a low price.
・During substrate re-coating: Film thickness distribution ±5% or less (within Φ100mm)
・When the board is stationary: Film thickness distribution ±10% or less (within Φ40mm)
・Equipped with a load lock chamber to reduce cycle time
・Improved screen visibility and operability with LCD touch panel
・Automation of vacuum evacuation, substrate transfer, and discharge timer
・Flexible support for equipment modification and deployment
-
Product
Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series
-
Handling Company
Sanko Ematech Co., Ltd.
-
Categories
2 Models of Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series
Items marked with have different values depending on the model number.
Click on the part number for more information about each product
| Product Image | Part Number | Price (excluding tax) | Ar gas for sputtering | Auxiliary pump | Board size | Compressed air | Cooling water pressure | Cooling water running water | Cooling water temperature | Earth | Film thickness distribution | Forming film | Gas introduction system | Heater | High frequency power supply | Installation area | Interelectrode distance | Main pump | Manufacturer | N2 gas for chamber leak | N2 gas for pump leak | Number of boards installed | Number of revolutions | Option | Power supply | Pump exhaust allowable exhaust port pressure | Sputter method | Target holder | Ultimate pressure | Ultimate pressure Load lock chamber | Ultimate pressure Sputtering chamber | Weight |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
|
HSR-351 |
Available upon quote | 0.1~0.2MPa・G | Oil rotary vacuum pump (RP) | When rotating ⇒ Φ150mm, when stationary ⇒ Φ50mm | 0.4~0.5MPa・G | 0.2~0.3MPa・G | 6L/min | 5~25℃ | A type | When rotating ⇒ Φ100mm area ±5%, when stationary ⇒ Φ40mm area ±10% | Metals, insulators, etc. | Ar-mass flow controller (MFC) 1 system | MAX300℃ (substrate surface) | 13.6MHz 200W | W1,930mm×D1,100mm×H1,650mm | 70~110mm | Oil diffusion vacuum pump (DP) | Shimadzu Industrial Equipment Systems Co., Ltd. | 0.1~0.2MPa・G (air is also possible) | 0.02MPa・G (air is also possible) | 1 piece | MAX20rpm | Oil mist trap, liquid nitrogen trap, reverse sputtering mechanism | AC200V, 3Φ, 60Hz, 5KVA | 20kPa・G or less | Depot up | 2 inch 3 units | 10-4Pa level | - | - | 480Kg |
|
|
HSR-351L (with load lock) |
Available upon quote | 0.1~0.2MPa・G | Oil rotary vacuum pump (RP) | When rotating ⇒ Φ150mm, when stationary ⇒ Φ50mm | 0.4~0.5MPa・G | 0.2~0.3MPa・G | 6L/min | 5~25℃ | A type | When rotating ⇒ Φ100mm area ±5%, when stationary ⇒ Φ40mm area ±10% | Metals, insulators, etc. | Ar-mass flow controller (MFC) 1 system | MAX300℃ (substrate surface) | 13.6MHz 200W | W2,800mm×D1,100mm×H1,650mm | 70~110mm | Oil diffusion vacuum pump (DP) | Shimadzu Industrial Equipment Systems Co., Ltd. | 0.1~0.2MPa・G (air is also possible) | 0.02MPa・G (air is also possible) | 1 piece | MAX20rpm | Oil mist trap, liquid nitrogen trap, reverse sputtering mechanism | AC200V, 3Φ, 60Hz, 5KVA | 20kPa・G or less | Depot up | 2 inch 3 units | - | 6.7Pa | 10-4Pa level | 500Kg |
Click on the part number for more information about each product
Customers who viewed this product also viewed
![[MiniLab-GB] Glove box thin film experimental device MiniLab-026-GB-](https://metoree.s3.ap-northeast-1.amazonaws.com/img/products-new/3007428202411173.png)
Other products of Sanko Ematech Co., Ltd.
View more products of Sanko Ematech Co., Ltd.
About Company Handling This Product
- Japan