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Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series-HSR-351
Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series-Sanko Ematech Co., Ltd.

Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series
Sanko Ematech Co., Ltd.

Sanko Ematech Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

38.3hours


About This Product

■Product description

It is an ideal device for research and development purposes at universities, research institutes, etc. It is also ideal for high-mix, low-volume production. Device status and various parameters can be set and checked on the touch panel, improving visibility and operability. Operability: Semi-automatic function ⇒ A series of investigations from loading and unloading the board from the load lock chamber is easy. Film-forming auxiliary function ⇒・Automatically operates discharge stop and gas valve closing after sputtering based on film-forming time parameters. Sputter processing time can be set in advance, reducing unnecessary costs caused by forgetting to turn off the discharge or forgetting to close the gas valve even if the operator is not always present. Safety: Interlock prevents erroneous operation, alarm function ensures safety, abnormality handling details are displayed to support recovery work, abnormality history records the date and time of occurrence.Maintenance: Efficient maintenance is performed according to the user's device operating status. Maintenance parameters are provided so that you can set them as you like.

■Features

・It is a high-performance, easy-to-use product at a low price. ・During substrate re-coating: Film thickness distribution ±5% or less (within Φ100mm) ・When the board is stationary: Film thickness distribution ±10% or less (within Φ40mm) ・Equipped with a load lock chamber to reduce cycle time ・Improved screen visibility and operability with LCD touch panel ・Automation of vacuum evacuation, substrate transfer, and discharge timer ・Flexible support for equipment modification and deployment

  • Product

    Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series

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2 Models of Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series

Click on the part number for more information about each product

Image Part Number Price (excluding tax) High frequency power supply Power supply Interelectrode distance Weight Installation area Auxiliary pump Film thickness distribution Forming film Number of boards installed Board size Compressed air Number of revolutions Ultimate pressure Load lock chamber Ultimate pressure Sputtering chamber Cooling water temperature Cooling water running water Cooling water pressure Main pump Manufacturer Pump exhaust allowable exhaust port pressure N2 gas for pump leak Heater N2 gas for chamber leak Target holder Ar gas for sputtering Sputter method Gas introduction system Earth Ultimate pressure Option
Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series-Part Number-HSR-351

HSR-351

Available upon quote

13.6MHz 200W

AC200V, 3Φ, 60Hz, 5KVA

70~110mm

480Kg

W1,930mm×D1,100mm×H1,650mm

Oil rotary vacuum pump (RP)

When rotating ⇒ Φ100mm area ±5%, when stationary ⇒ Φ40mm area ±10%

Metals, insulators, etc.

1 piece

When rotating ⇒ Φ150mm, when stationary ⇒ Φ50mm

0.4~0.5MPa・G

MAX20rpm

- -

5~25℃

6L/min

0.2~0.3MPa・G

Oil diffusion vacuum pump (DP)

Shimadzu Industrial Equipment Systems Co., Ltd.

20kPa・G or less

0.02MPa・G (air is also possible)

MAX300℃ (substrate surface)

0.1~0.2MPa・G (air is also possible)

2 inch 3 units

0.1~0.2MPa・G

Depot up

Ar-mass flow controller (MFC) 1 system

A type

10-4Pa level

Oil mist trap, liquid nitrogen trap, reverse sputtering mechanism

Load-lock type high-frequency magnetron 3-layer sputtering equipment STNTRON HSR-351 series-Part Number-HSR-351L (with load lock)

HSR-351L (with load lock)

Available upon quote

13.6MHz 200W

AC200V, 3Φ, 60Hz, 5KVA

70~110mm

500Kg

W2,800mm×D1,100mm×H1,650mm

Oil rotary vacuum pump (RP)

When rotating ⇒ Φ100mm area ±5%, when stationary ⇒ Φ40mm area ±10%

Metals, insulators, etc.

1 piece

When rotating ⇒ Φ150mm, when stationary ⇒ Φ50mm

0.4~0.5MPa・G

MAX20rpm

6.7Pa

10-4Pa level

5~25℃

6L/min

0.2~0.3MPa・G

Oil diffusion vacuum pump (DP)

Shimadzu Industrial Equipment Systems Co., Ltd.

20kPa・G or less

0.02MPa・G (air is also possible)

MAX300℃ (substrate surface)

0.1~0.2MPa・G (air is also possible)

2 inch 3 units

0.1~0.2MPa・G

Depot up

Ar-mass flow controller (MFC) 1 system

A type

-

Oil mist trap, liquid nitrogen trap, reverse sputtering mechanism

Click on the part number for more information about each product

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About Company Handling This Product

Response Rate

100.0%


Response Time

38.3hrs


Company Review

5.0
  • Japan

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