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  4. Ideal for polishing electronic materials such as SIC wafers chemical liquid (Musashino Denshi, INC.)
Ideal for polishing electronic materials such as SIC wafers chemical liquid-Chemical liquid
Ideal for polishing electronic materials such as SIC wafers chemical liquid-Musashino Denshi, INC.

Ideal for polishing electronic materials such as SIC wafers chemical liquid
Musashino Denshi, INC.

Musashino Denshi, INC.'s Response Status

Response Rate

100.0%

Response Time

4.9hours

Very Fast Response

About This Product

When performing polishing, it is important to select an abrasive that is suitable for samples. When handling a sample that responds to water, it is used by mixing oily abrasives and polished abrasive grains and lubricating oil. When the polishing surface is made a mirror finish, polish it using a CMP abrasive. In this way, we propose the best abrasive for the sample ingredients and the finishing goals of the polishing surface. It is possible to remove the distortion of the sample, the deterioration layer, and the fine scratch scratch. Ideal for polishing electronic materials such as SIC wafers.

■ Features

・ SIO2 (silicon dioxide) and H2O (water) are the main ingredients for CMP. ・ Finish polishing work is possible with a 0.04 μm (40 nm) abrasive grain. ・ Ideal for CMP polishing of electronic materials such as SIC wafers.

■ Use

・ Gallium oxide (GA2O3) ・ Calcium fluff (CAF2) ・ Germanium Acids (Bi4ge3O12) ・ Lithium tantalate (Lita3) ・ Lithium niovate (Linbo3) ·sapphire ・ Glass ・ Ceramics ... etc.

  • Product

    Ideal for polishing electronic materials such as SIC wafers chemical liquid

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1 Models of Ideal for polishing electronic materials such as SIC wafers chemical liquid

Image Part Number Price (excluding tax) capacity Particle size pH value
Ideal for polishing electronic materials such as SIC wafers chemical liquid-Part Number-Chemical liquid

Chemical liquid

Available upon quote

4L, 1L

0.04μm

Ten

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About Company Handling This Product

Musashino Denshi, INC.

Response Rate

100.0%

Response Time

4.9hrs

Company Overview

Musashino Denshi, INC., established in 1977 and based in Japan, is a manufacturer of grinding and polishing ma...

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  • Japan

Related search keywords

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