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  2. Achieving an excellent polishing surface CMP pad / IC1000 ™ (Musashino Denshi, INC.)
Achieving an excellent polishing surface CMP pad / IC1000 ™-CMP Pad / IC1000 ™
Achieving an excellent polishing surface CMP pad / IC1000 ™-Musashino Denshi, INC.

Achieving an excellent polishing surface CMP pad / IC1000 ™
Musashino Denshi, INC.

Musashino Denshi, INC.'s Response Status

Response Rate

100.0%

Response Time

4.6hours

Company Review

5.0

Very Fast Response

About This Product

■ Polishing supplies used in the CMP (scientific mechanical polishing) process

・ By applying it on an aluminum board (with a brim), it is possible to polish in the liquid on the board filled with a CMP solution. ・ By pasting on a flat aluminum board, you can polish by dropping the CMP solution. It is possible to remove fine scratches that could not be removed by polishing cloth, etc. ・ It is a urethane pad for CMP polishing. The special structure is uniformly spread to the abrasive to achieve an excellent polishing surface.

■ Features

・ Suitable for CMP (Chemical Mechanical Polishing) process. ・ It is a special polyurethane pad with a high -uniform micro foam structure. ・ The abrasive is uniformly spread to achieve an excellent polishing surface. ・ It has both high step easing performance and low scratch performance.

■ CMP Pad / IC1000 ™ application

・ CMP polishing of device wafer insulation film ・ Metal wiring CMP polishing ・ Compound infrastructure such as GAN, SIC, etc.

  • Product

    Achieving an excellent polishing surface CMP pad / IC1000 ™

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1 Models of Achieving an excellent polishing surface CMP pad / IC1000 ™

Image Part Number Price (excluding tax) Material Outer diameter quantity thickness Compression rate density Hardness (D) Abrasive Granularity Process
Achieving an excellent polishing surface CMP pad / IC1000 ™-Part Number-CMP Pad / IC1000 ™

CMP Pad / IC1000 ™

Available upon quote

Special polyurethane

Φ150mm, φ200mm, φ300mm, φ381mm

5 sheets/equation

1.17mm -

0.5% -

0.77g/cm3 -

52 -

Coloidal silica abrasive, chemical liquid ... etc.

0.015μm ~ 0.0825μm

CMP polishing

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About Company Handling This Product

Musashino Denshi, INC.

Response Rate

100.0%

Response Time

4.6hrs

Company Review

5.0

Company Overview

Musashino Denshi, INC., established in 1977 and based in Japan, is a manufacturer of grinding and polishing ma...

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