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  2. Excellent surface accuracy CMP cloth (Musashino Denshi, INC.)


Excellent surface accuracy CMP cloth-CMP cross
Excellent surface accuracy CMP cloth-Musashino Denshi, INC.

Excellent surface accuracy CMP cloth
Musashino Denshi, INC.

About This Product

■ Polishing supplies used in the CMP (scientific mechanical polishing) process ・ By applying it on an aluminum board (with a brim), it is possible to polish in the liquid on the board filled with a CMP solution. ・ By pasting on a flat aluminum board, you can polish by dropping the CMP solution. It is possible to remove fine scratches that could not be removed by polishing cloth, etc. ・ Bond polyurethane to non -woven fabric composed of special polyester fiber. CMP cloth that realizes high flatness and high durability. ■ Features ・ Ideal for use during the final process in polishing with a soft non -woven cloth cross. ・ It is also suitable for the edge mirror finish in addition to gaining excellent surface accuracy. ■ Use ・ CMP polishing of device wafer insulation film ・ Metal wiring CMP polishing ・ CMP polishing of compound semiconductors such as SIC, GAN, GA2O3, etc.

  • Product

    Excellent surface accuracy CMP cloth



*Please note that we may not be able to accommodate sample requests.

1 Models of Excellent surface accuracy CMP cloth

Product Image Part Number Price (excluding tax) Abrasive Compressed elasticity rate Compression rate Granularity Hardness (C) Material Outer diameter Process density quantity thickness
Excellent surface accuracy CMP cloth-Part Number-CMP cross

CMP cross

Available upon quote Coloidal silica abrasive, chemical liquid ... etc. 80 % 0.04 0.015μm ~ 0.0825μm 72 Special polyester polyurethane Φ150mm, φ200mm, φ300mm, φ380mm CMP polishing 0.32g/cm3 5 sheets/equation T1.55mm

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At the same time, multiple samples are polished and embedded.-Musashino Denshi, INC.

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About Company Handling This Product

Musashino Denshi, INC.

  • Japan
  • Since 1977

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