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Excellent surface accuracy CMP cloth-CMP cross
Excellent surface accuracy CMP cloth-Musashino Denshi, INC.

Excellent surface accuracy CMP cloth
Musashino Denshi, INC.


About This Product

■ Polishing supplies used in the CMP (scientific mechanical polishing) process

・ By applying it on an aluminum board (with a brim), it is possible to polish in the liquid on the board filled with a CMP solution. ・ By pasting on a flat aluminum board, you can polish by dropping the CMP solution. It is possible to remove fine scratches that could not be removed by polishing cloth, etc. ・ Bond polyurethane to non -woven fabric composed of special polyester fiber. CMP cloth that realizes high flatness and high durability.

■ Features

・ Ideal for use during the final process in polishing with a soft non -woven cloth cross. ・ It is also suitable for the edge mirror finish in addition to gaining excellent surface accuracy.

■ Use

・ CMP polishing of device wafer insulation film ・ Metal wiring CMP polishing ・ CMP polishing of compound semiconductors such as SIC, GAN, GA2O3, etc.

  • Product

    Excellent surface accuracy CMP cloth

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1 Models of Excellent surface accuracy CMP cloth

Image Part Number Price (excluding tax) Material Outer diameter quantity thickness density Hardness (C) Compression rate Compressed elasticity rate Abrasive Granularity Process
Excellent surface accuracy CMP cloth-Part Number-CMP cross

CMP cross

Available upon quote

Special polyester polyurethane

Φ150mm, φ200mm, φ300mm, φ380mm

5 sheets/equation

T1.55mm

0.32g/cm3

72

0.04

80 %

Coloidal silica abrasive, chemical liquid ... etc.

0.015μm ~ 0.0825μm

CMP polishing

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About Company Handling This Product

Company Overview

Musashino Denshi, INC., established in 1977 and based in Japan, is a manufacturer of grinding and polishing ma...

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  • Japan

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