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This section provides an overview for sputtering equipment as well as their applications and principles. Also, please take a look at the list of 9 sputtering equipment manufacturers and their company rankings. Here are the top-ranked sputtering equipment companies as of April, 2025: 1.Alliance Concept, 2.Vapor Technologies, Inc., 3.Blue Wave Semiconductors.
Table of Contents
Sputtering equipment is a device that performs sputtering to create a very thin film uniformly on the surface of an object.
Sputtering is a physical vapor deposition (PVD) method, like vacuum evaporation and ion plating. Sputtering is used in various fields, including the deposition of semiconductor and liquid crystal films. It is also used to clean the surface of objects.
Sputtering equipment is used to fabricate thin films for semiconductors, liquid crystals, and plasma displays. Compared to other PVD evaporation systems, sputtering equipment is capable of depositing metals and alloys with high melting points, and thus has a wide range of applications.
Recently, metals have been deposited on the surface of plastic, glass, and film to make them conductive and used as transparent electrodes and wiring for touch panels. This, further expands the range of applications for sputtering equipment.
In addition, medical devices and miscellaneous goods with antibacterial properties coated with photocatalytic titanium dioxide on their surfaces are also available. It is also used in analytical applications, such as sample preparation for scanning electron microscopes (SEM).
Sputtering equipment mainly consists of the following components:
The vacuum chamber contains a sample stand that holds the substrate and a sputtering target that supplies the sputtering material, while the vacuum pump and gas supply system are connected to the chamber.
The principle of sputtering equipment is to deposit a film on the surface of an object by applying high voltage under vacuum and repelling the atoms of the film material. First, the chamber is sufficiently depressurized by a pump, and then inert gases such as argon are filled into the equipment at a constant pressure.
When a high negative voltage is applied to the target, which is the material for the thin film, and a glow discharge is generated, the argon filled in the equipment becomes plasma and collides with the target on the cathode, causing the Ions, atoms and molecules on the target to be ejected. The target atoms are then deposited on the surface of the target to which the positive voltage is applied, resulting in the production of a thin film.
There are various types of sputtering methods.
This method applies DC voltage between electrodes. This method has various advantages, such as a simple structure. However, the disadvantages include the possibility that the sample may be damaged by the high-temperature plasma and the inability to form a film properly if the sputtering target is an insulator.
This method applies a high-frequency AC voltage between electrodes to form films on materials such as ceramics, silica and other oxides, metal oxides, and nitrides, which cannot be formed by the DC method.
This method uses a magnet to create a magnetic field on the target side to keep the plasma near the target. This not only reduces damage to the sample caused by the plasma, but also increases the plasma generation speed, resulting in faster film formation. Various power supply methods are available, including DC, AC, and high-frequency AC. On the other hand, the target is reduced unevenly and the utilization efficiency tends to be low.
Ions are produced at a separate location from the target or sample and accelerated to the target. Since there is no discharge in the chamber, the effect on the sample is minimized and there is no need to consider the adhesion of impurities or the conductivity of the target.
In addition to the above, there are various types of sputtering equipment, such as Electron Cyclotron (ECR), which should be selected appropriately according to the application and budget.
Sputtering equipment can make the film thickness uniform, and since it uses electrical properties, it can increase the strength of the film. It can produce films of high-melting-point metals and alloy materials, which is difficult with other PVD methods. Another method is to fill oxygen instead of argon or other inert gases to deposit oxide films.
However, there are some disadvantages, such as the longer time required for film deposition compared to other PVD methods and the risk of damaging the sputtering target by the generated plasma.
*Including some distributors, etc.
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VaporTech designs, builds, and services thin-film coating equipment which deposit PVD and PE-CVD coatings to enhance the quality of numerous products. We exhibit a steadfast commitment to our craft, recognizing that a product's finish is a direct reflection of its quality, underlining a brand's dedication to quality and value. For over three decades, VaporTech's PVD coating equipment has been assisting customers in applying stunning and durable hard coatings that not only enhance but differentiate the aesthetics, texture, and functionality of a plethora of items including home hardware, medical devices, automobiles, industrial tooling, consumer electronics, sporting goods, among others. We are located in Longmont, Colorado, extending our sales, service, and support on a global scale.
Semicore Equipment, Inc. is a deposition equipment and custom vacuum systems manufacturer based in Livermore, California since 1996. The company showcases a diverse product catalog, serving multiple fields like the electronics, optical, solar energy, medical, and automotive industries. It produces items such as sputtering, evaporation, PVD coating and custom systems, as well as DLC tribology coaters and magnetron sputtering cathodes. In addition, the venture offers tooling and fixturing, innovative solutions and automation control services.
Blue Wave Semiconductors was established in the year 2000, located in Baltimore, USA and it is a manufacturer and supplier of thin-film deposition systems. The company manufactures products such as deposition equipment, CVD diamond machine systems, and electron beam evaporators. The company also provides services like thin-film coatings, CVD diamond coatings, metal deposition and optical coatings. It's R&D services include CVD diamond coatings on custom structures and parts. The company is ISO certified.
Ulvac Inc., established in 1952 and headquartered in Kanagawa, Japan, is a manufacturer of vacuum equipment, components, peripheral devices, and materials for the solar cell and semiconductor industries, among others. The company operates businesses in six areas, including materials, components, electronic devices, semiconductors, and flat panel display production equipment. Some of its products include roll coaters, semiconductor production equipment, LED production equipment, leak detectors, and vacuum brazing furnaces. It is ISO9001 certified, and its net sales in the 2022 fiscal year were 227.5 billion Japanese Yen, with 34% of this amount coming from semiconductor and electronic device production equipment.
Alliance Concept, based in France, is a manufacturer of vacuum systems and equipment since 1991. The company excels across three distinct sectors: thin film deposition, leak testing, and vacuum technology. The company designs and produces cutting-edge frames or thin film deposition. This technology finds extensive use in various industries, enabling precise and controlled deposition of thin films onto surfaces. The company's proficiency extends to leak testing, a critical process for ensuring the integrity of products that require containment. Furthermore, its expertise in vacuum technology covers a broad spectrum of applications.
CANON ANELVA is a manufacturer and supplier of vacuum deposition systems and related systems headquartered in Kanagawa, Japan. The company was established in 1967 and specializes in producing a wide array of products that cater to sectors such as semiconductor manufacturing, electronics, and beyond. The company's product portfolio includes vacuum deposition systems, spluttering equipment, and other advanced technology solutions designed to meet the demands of modern manufacturing processes. These products play an integral role in enhancing the efficiency and performance of manufacturing processes across a diverse range of applications.
Sputtering Components, a member of the Bühler Group, established in 2001 and headquartered in Owatonna, USA, is a manufacturer of vacuum coating systems and related components. The company offers end blocks, magnetrons, and complete lid systems, enabling the production of windows, smartphones, and automotive components. Using Solidworks for 3D modeling, it employs finite element analysis for magnetic and thermal simulations. The company fabricates components with diameters ranging from 0.1 to 60 inches. Its rotary magnetron technology serves solar cells, touch screen production, and decorative coatings, while its swing-duotm software enhances coating uniformity through optimized magnet bar movement.
Omicron Scientific Equipment was established in the year 2000 based in New Delhi, India and it is a manufacturer, supplier, and exporter of scientific equipment. The company manufactures products like microwaves, radio frequency equipment, DC power supplies, thermal evaporation systems, electron beam gun-based evaporation systems, spin coating systems, scrubbers, semiconductor processing equipment, chemical benches, equipments for research and development and vacuum furnaces. The company is a member of Trade India and is also ISO certified.
Ranking as of April 2025
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | Alliance Concept |
15.9%
|
| 2 | Vapor Technologies, Inc. |
13.4%
|
| 3 | Blue Wave Semiconductors |
12.9%
|
| 4 | ULVAC, Inc |
12.1%
|
| 5 | Semicore Equipment, Inc. |
10.8%
|
| 6 | Omicron Scientific Equipment Co. |
10.1%
|
| 7 | CANON ANELVA CORPORATION |
9.5%
|
| 8 | Japan Create Co., Ltd. |
8.0%
|
| 9 | Sputtering Components |
7.3%
|
Derivation Method
The ranking is calculated based on the click share within the sputtering equipment page as of April 2025. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
Newly Established Company
Company with a History
*Including some distributors, etc.
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
|
United States of America
|
3 | 37.5% |
|
Japan
|
3 | 37.5% |
|
France
|
1 | 12.5% |
|
India
|
1 | 12.5% |
80 products found - Page 2
80 products - Page 2
SHINKO SEIKI CO., LTD.
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■Summary The ENTRONTM-EX2 W300 multi-chamber sputtering system is a state-of-the-art platform that connects a variety of processes. This is a high-...
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■Summary The multi-chamber device ENTRONTM N300 is a just-fit device that provides appropriate investment efficiency. In addition to PVD and CVD, i...
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■Summary The SMD series is a single-wafer sputtering system that forms metal films, ITO, IGZO, dielectric films, etc. We have a rich track record o...
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■Summary The SPW series is a roll-up type sputtering device that can form multilayer films such as optical films and metals on plastic films. By se...
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■Summary The SV series is a vertical batch type sputtering device. There is the SV-200, which is dedicated to disk stampers, and the carousel type,...
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Standard Response
5.0 Company Review
■Product description This is a sputtering device that can deposit two types of films on each side. ■Applications Formation of metal films for elec...
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By using a sputter gun compatible with high vacuum, it is possible to form thin films even at 10-2Pa levels. It is possible to install sputter guns...
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By using a sputter gun compatible with high vacuum, it is possible to form thin films even at 10-2Pa levels. It is possible to install sputter guns...
