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This section provides an overview for semiconductor lithography equipment as well as their applications and principles. Also, please take a look at the list of 11 semiconductor lithography equipment manufacturers and their company rankings. Here are the top-ranked semiconductor lithography equipment companies as of January, 2025: 1.Finisar, 2.INTEGRATED DYNAMICS ENGINEERING GmbH, 3.ASML Holding N.V..
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Categories Related to Semiconductor Lithography Equipment
Department of Chemistry, Graduate School of Science, Tohoku University (Master of Science)
As a display engineer, engaged in Seiko Epson Corporation, Sony Corporation, Japan Display Corporation, etc.
https://researchmap.jp/tanakachihiro
https://www.linkedin.com/in/chihiro-tanaka/
Semiconductor Lithography Equipment is used to depict circuit patterns on silicon wafers in the semiconductor manufacturing process. A powerful ultraviolet light is transmitted through a photomask, which serves as a prototype for the circuit pattern, and the circuit pattern is transferred onto a silicon wafer coated with photoresist. In recent years, some equipment uses a laser with a wavelength of 13 nm, called EUV, to miniaturize fine circuit patterns. Since extremely high precision is required for positioning, etc., the equipment is expensive.
Semiconductor Lithography Equipment is used in the exposure process of manufacturing integrated circuits (ICs), which include semiconductor devices such as MOS (metal oxide semiconductor)-FETs (field effect transistors).
In the IC manufacturing process, photolithography and etching cycles are repeated sequentially on a silicon wafer to stack and process layers (layers) of silicon oxides and metals in a predetermined pattern, which are processed to have the characteristics required for semiconductor devices. In the case of n-type MOS (NMOS), for example, an n-type (n+ type) MOS is formed by forming a silicon oxide film in the gate region on a p-type silicon substrate and a gate metal on top of it, and ion implanting high concentration impurities in the drain and source regions. Each of the photolithography and etching steps in this series of processes is configured as shown in the figure (film deposition process S1~resist stripping process S6).
Of these, the exposure process (S3) is the process performed using Semiconductor Lithography Equipment. Different wavelengths of exposure equipment are used depending on the dimensions of the circuit pattern and the accuracy of the Semiconductor Lithography Equipment.
Semiconductor Lithography Equipment consists of a light source, condenser lens, photomask, projection lens, and stage. Ultraviolet light generated from the light source is adjusted by the condenser lens so that they face the same direction. The ultraviolet light then passes through a photomask, which serves as a prototype for one layer of the circuit pattern, and the light is reduced by the projection lens to transfer the circuit pattern (one layer of the circuit pattern) of the semiconductor device onto the silicon wafer. In an exposure system such as a stepper, once the transcription is completed, the silicon wafer is moved by the stage and the same circuit pattern is transferred to another position on the silicon wafer. By replacing the photomask, another layer of the circuit pattern of the semiconductor device can be transferred.
KrF excimer lasers with a wavelength of 248 nm, ArF excimer lasers with a wavelength of 193 nm, and EUV light sources with a wavelength of 13 nm are used as light sources.
The design rule (minimum processing dimension) for the latest semiconductor manufacturing process has been miniaturized to 3 to 5 nm, so high precision on the nanometer scale is required for all condenser lenses, photomasks, projection lenses, and stages. Also, because of the progress of stacking, exposure is performed several times before a single semiconductor is produced by changing the circuit pattern.
The global electronics market continues to expand, and the semiconductor industry is becoming increasingly important in supporting this expansion. The global semiconductor market experienced negative growth in 2019, but has continued to expand in the past despite experiencing the Lehman Shock and other problems. In recent years, memory technology development has shifted from miniaturization to 3D, and etching technology has become more important.
The Semiconductor Lithography Equipment market size is 1.852 trillion yen as of 2018.
The market share by consumption region is as follows: 1st South Korea 36%, 2nd Taiwan 19%, 3rd China 18%, 4th US 14%, and 5th Japan 7%. Semiconductor Lithography Equipment vendor share by nationality (2018) is almost oligopolized by Europe and Japan, with Europe (84%), Japan (14%), and the United States (2%).
EUV (Extreme Ultraviolet) Lithography Equipment is Semiconductor Lithography Equipment that uses extremely short wavelength light called Extreme Ultraviolet Light. It enables processing of finer dimensions that are difficult to process with conventional exposure systems using ArF excimer laser light.
Semiconductor manufacturing has been progressively miniaturized in accordance with Moore's Law (semiconductor integrated circuits become four times more highly integrated and functional in three years). The development of reduced projection exposure technology called steppers, shorter exposure wavelengths, and immersion exposure technology has dramatically improved resolution.
Miniaturization means that the minimum process size that can be burned onto a wafer becomes smaller, and the minimum process size R is expressed by the following Rayleigh's formula.
R = k/λ/NA *k is a proportionality constant, λ is the exposure wavelength, and N.A. is the numerical aperture of the exposure optical system.
Various technological developments have enabled miniaturization by making k smaller, λ smaller, and NA larger.
EUV lithography systems are considered to be a technology that can break through the limitations of the past by shortening the exposure wavelength, and they have been mass-produced in recent years.
Semiconductor Lithography Equipment is indispensable for the efficient mass production of semiconductors.
The shorter the wavelength of the light source used in Semiconductor Lithography Equipment, the finer the pattern can be formed and the more expensive the exposure equipment becomes. For each wavelength, i-line lithography costs about 400 million yen, KrF about 1.3 billion yen, ArF dry about 2 billion yen, ArF immersion about 6 billion yen, and EUV about 20 billion yen.
The finer the circuit, the faster the signal transmission and the more energy efficient it can be, but in recent years, the increase in process cost due to miniaturization, including the price of Semiconductor Lithography Equipment, has become impossible to ignore.
In addition, the throughput of Semiconductor Lithography Equipment is also an important indicator of the required performance from the standpoint of semiconductor manufacturing costs. Throughput is a performance indicator of how fast a circuit pattern can be exposed, and as throughput increases, the production cost (running cost) per silicon die decreases. It is considered important during the mass production of semiconductor chips.
*Including some distributors, etc.
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Finisar Corporation is a manufacturer of optical communication components and subsystems. The company was founded in April 1987 and situated at Sunnyvale, California. The company is a global technology company in optical communications. Its products enable high-speed voice, video, and data communications for networking, storage, wireless, and cable TV applications. The company has created solutions in optics technology and supplied system manufacturers with production volume for network bandwidth. The company develops a product line primarily for telecommunications, using EY-amplification technologies including erbium-doped fiber amplification, Raman amplification, and dynamic hybrid amplification.
Ushio Inc., established in 1964 in Tokyo, Japan, is a manufacturer and supplier of specialized light sources, with a particular interest in ultraviolet (UV) and visible light. The company boasts an extensive product portfolio that includes various lighting solutions, including laser diodes, UV lamps, visible lights, lamps designed for projectors, and halogen lamps. These diverse products cater to a wide array of industries and applications, including architecture and landscape illumination, disinfection and deodorizing, litho-patterning, optical systems, as well as curing and bonding processes.
NIHON DEMPA KOGYO CO., LTD., founded in 1948, is a Japanese manufacturer and supplier headquartered in Shibuya-ku, Tokyo, specializing in crystal-related products. The company’s product line includes crystal units and oscillators, synthetic quartz crystals, quartz crystal microbalance (QCM) sensors, and millimeter-wave converters. Additionally, the company provides frequency synthesizers, optical components, outgas analysis systems, signal generators, and ultrasound probe (transducers). These products cater to sectors like automotive, healthcare, household appliances, industrial equipment, and medical. Notably, its collaboration with the Japan Aerospace Exploration Agency (JAXA) resulted in the QCM Thermogravimetric Gas Analysis (QTGA) system for analyzing outgas emissions from organic materials in vacuum settings.
ASML Holding N.V., established in 1984, is an ISO 9001:2015 certified manufacturer of lithography systems that are critical to the production of microchips, including EUV and DUV lithography systems, refurbished PAS 5500, and TWINSCAN systems, used in the medical and electronics industries. With its headquarters in Veldhoven, Netherlands, the company has other locations in the US, Asia, and Europe. The company offers relocation services, training services, customerNet portal for tailored information, and 24-hour delivery time.
NIKON CORPORATION was founded in Japan in 1917 and is a global manufacturer of imaging products, optics, precision equipment, and instruments. The company's main product offerings include the Nikon Z series of mirrorless cameras, digital SLR cameras, and COOLPIX. It also offers consumer and professional accessories such as NIKKOR brand optics, Speedlights, system accessories, and software products, along with premium sports and recreational optical products, including full-line binoculars, Fieldscopes, and rangefinders. The company complies with international standards such as ISO 14001:2015 and ISO 45001:2018, catering to industries such as photography and videography, healthcare, manufacturing, and research.
Kyodo International, Inc. established in 1970 and based in Kawasaki-shi, Japan, is a manufacturer and distributor of microfabrication tools and equipment. The company's product range includes deposition tools, photolithography equipment, etching machines, CMP processing units, and nanoimprinting tools. These products are used for the development and manufacturing of electronic components and systems. The company serves industries such as electronics manufacturing, microelectromechanical systems (MEMS) production, and life sciences, it ensures the delivery of high-precision tools for intricate manufacturing processes. Its services span the sale, repair, and overhaul of consumable parts.
EV Group (EVG), established in 1980 in Austria, is a supplier of high-volume production equipment and process solutions for semiconductor, MEMS, compound semiconductor, power device, and nanotechnology device manufacturing. Its product range includes lithography systems, bonding systems, nanoimprint lithography (NIL) equipment, metrology systems, and photoresist coaters, vital in semiconductor manufacturing. The company have earned numerous accolades, including the 3D InCites Award, 2023 ISES Equipment Manufacturer of the Year Award, and known as one of the suppliers of fab equipment to foundation chip makers, emphasizing its excellence in the industry.
Ranking as of January 2025
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | Finisar |
43.7%
|
| 2 | INTEGRATED DYNAMICS ENGINEERING GmbH |
13.8%
|
| 3 | ASML Holding N.V. |
8.3%
|
| 4 | S-Cubed, Inc |
7.8%
|
| 5 | EV Group |
6.2%
|
| 6 | Ushio Inc. |
4.9%
|
| 7 | Nikon Corporation |
4.4%
|
| 8 | NIHON DEMPA KOGYO CO., LTD. |
4.3%
|
| 9 | Kyodo International, Inc. |
3.5%
|
| 10 | Mikasa Co., Ltd |
2.7%
|
Derivation Method
The ranking is calculated based on the click share within the semiconductor lithography equipment page as of January 2025. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
Newly Established Company
Company with a History
*Including some distributors, etc.
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
|
Japan
|
6 | 60.0% |
|
United States of America
|
1 | 10.0% |
|
Netherlands
|
1 | 10.0% |
|
Austria
|
1 | 10.0% |
Germany
|
1 | 10.0% |
34 products found
34 products
Advantest Co., Ltd.
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Standard Response
■Features ・Achieving high-mix, low-volume production without masks at low cost and short TAT ・Supports miniaturization after 65nm node ・Achievin...
Neoark Co., Ltd.
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■Making photolithography more accessible Semiconductors were once called the "rice of industry". The technology that underpins the semiconductor pr...
Adtech Engineering Co., Ltd.
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■Product overview It is widely used not only for printed circuit boards, but also for manufacturing substrate core boards and build-up boards, whic...
Sanko Seikosho Co., Ltd.
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■Applications Optical condensing equipment, reflection mirrors for projection, exposure equipment for LCD devices, exposure equipment for IC equipm...
Neoark Co., Ltd.
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■Making photolithography more accessible Semiconductors were once called the "rice of industry". The technology that underpins the semiconductor pr...
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■PhableR 100 achieves high resolution below 300nm pitch ・PhableR 100 is a system based on EULITHA's proprietary exposure technology PHABLE (abbrev...
Neoark Co., Ltd.
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■Making photolithography more accessible Semiconductors were once called the "rice of industry". The technology that underpins the semiconductor pr...
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The substrate projection exposure system LS-360SB is a stepper exposure machine equipped with a high-quality UV light source, a high-resolution pro...
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■Realizes photolithography to create three-dimensional shapes Photolithography is used in a wide range of fields, but it is generally applied to fl...
Adtech Engineering Co., Ltd.
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■Product overview Our contact exposure equipment is based on the concept of high productivity and high precision alignment. We will suggest the mos...
Adtech Engineering Co., Ltd.
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■Product overview From applying FO-WLP-Wafer to applying PLP-panel size. It enables direct drawing on high-definition package substrates and high-d...
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The ME-120F maskless exposure system is a device that uses exposure to draw patterns on semiconductor wafers, etc. Direct writing is performed usin...
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PMT Co., Ltd.
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The maskless exposure system D-Light DL-1000 is a device that draws patterns on semiconductor wafers etc. using exposure. High-speed time modulatio...
Uenoyama Kikou Co., Ltd.
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■Exposure machine using LED light ・By using an LED light strip, we achieve "high-speed, uniform, and high-resolution" exposure. ・LED lights opera...
3 models listed
PMT Co., Ltd.
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Minimal maskless exposure equipment uses a display element called a DMD (Digital Micromirror Device) to draw patterns directly onto the wafer throu...
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■Features ・All functions are compactly integrated ・Achieved 20% increase in takt time compared to our standard machine ・Two types of alignment m...
Izumiya Machinery Co., Ltd.
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PCB (print circuit board) manufacturing exposure (with baking) device in a clean room. In the nanotechnology era, clean rooms require more precise,...
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■Features ・Manual exposure device ideal for other product types, small lot production, experiments, and research. (Effective exposure range φ6 inc...
Kyodo International, Inc.
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The PhableR100 is a special device that uses the Talbot effect to expose periodic structures at a fine, single-shot exposure with a half pitch of 1...
Kyodo International, Inc.
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The Model 2000 is a fully automatic type device that can perform flood exposure or edge bead exposure. Shadow mask technology facilitates manufactu...
Tsubosaka Electric Co., Ltd.
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■Features ・Exposure and printing equipment that guarantees parallelism ・Equipped with a 2kW ultra-high pressure mercury lamp ・Controlled by dedi...
Tsubosaka Electric Co., Ltd.
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■Features ・Simple exposure and printing equipment for photolithography process ・Tabletop type/integrated type saves space ・Equipped with color L...
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■Summary This is an exposure device that can draw directly from CAD data without making a mask. ■Advantages ・Zero lead time for mask production. ...
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■Summary We have exposure machines from various companies that can meet your needs.
