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This section provides an overview for resists as well as their applications and principles. Also, please take a look at the list of 24 resist manufacturers and their company rankings. Here are the top-ranked resist companies as of December, 2024: 1.Transene Company, Inc., 2.FUJIFILM Holdings America Corporation, 3.Baoding Lucky Innovative Materials Co.,Ltd..
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Graduated from Kyoto University, Faculty of Science, Graduate School of Science, Master (Chemistry). Joined a major general chemical manufacturer listed on the First section of the Tokyo Stock Exchange in April 2013. Engaged in analysis and scale-up of new functional polymers. Moved to another major manufacturer since May 2021. Specializes in analytical chemistry, physical chemistry, polymer chemistry, and polymer molding and processing.
https://www.linkedin.com/in/yuta-ishino-1bb143229/
A resist is a material used to protect specific areas of a substrate in processes such as etching and soldering. Generally, "photoresist" used in semiconductor processes are simply called "resist".
When a photoresist absorbs light of a specific wavelength, the chemical structure of the photoresist changes, and its solubility in cleaning and developing solutions also changes. Therefore, after applying resist to a substrate, it is possible to solubilize or insolubilize only a portion of the resist by irradiating light onto the substrate through a mask depicting a circuit pattern.
When the substrate is washed with a developing solution in this state, only the soluble resist is eluted, and only a portion of the substrate is protected by the resist.
There are two types of resist: positive type resist, in which the light-irradiated area dissolves in the developing solution, and negative type resist, in which the light-irradiated area becomes insoluble.
Resists are materials that protect specific locations in processes such as etching and soldering. Photoresist, which is a photosensitive agent in the semiconductor process, is often referred to simply as resist. Therefore, this article will also introduce photoresists.
Photoresists change their chemical structure when exposed to light and develop chemical resistance or, conversely, dissolve in a developing solution.
Using this property, photoresists applied on a silicon wafer are irradiated with light through a mask depicting a predetermined pattern and finally washed with a developing solution to create a processed area without resists and a non-processed area protected by resists on the substrate.
Resists are one of the indispensable materials for manufacturing highly integrated and miniaturized semiconductor integrated circuits.
Figure 1. How to use resist
In the semiconductor manufacturing process, silicon wafers are etched to create fine irregularities. Resists are used to selectively protect the substrate during the etching process.
First, resists are uniformly applied on the substrate, and then light is irradiated through a mask that depicts IC circuits on the resists. The chemical structure of the resists at the irradiated area is changed by absorption of light, and the solubility of the resists in the developing solution can be changed depending on whether the resists are irradiated or not. In the case of positive type resists, the light-irradiated area becomes soluble, while in the case of negative type resists, the non-irradiated area becomes soluble.
Thus, by etching with resists selectively remaining on the substrate, it is possible to selectively remove the substrate only in the areas where there are no resists.
After etching, the resists remaining on the substrate are removed and cleaned to complete the substrate patterning.
Figure 2. Resist and LCD
Some resists are called color resists, which are inks containing pigments or other color materials. Color resists applied on a glass substrate are cured by irradiating it with light such as ultraviolet light so that the resists are not washed away by the developing solution after light irradiation.
Liquid crystal displays are patterned with the three primary colors of red, green, and blue, and color resists are used here. Red, green, and blue patterns can be formed by first applying red color resists, light-curing only the designated areas, and then washing with a developing solution, followed by the same process for green and blue color resists.
Figure 3. Types of resist
In addition to the classification of positive type and negative type, resist materials can also be classified according to the wavelength of light they absorb.
In the semiconductor manufacturing process, g-line (wavelength: 436 nm), i-line (365 nm), KrF excimer laser (248 nm), and ArF excimer laser (193 nm) are used in lithography equipment, and resists with a structure of absorbing each wavelength are available.
For example, positive photoresists for g- and i-line lasers use a compound consisting of a Novolac resin and 1,2-naphthoquinone diazide sulfonate (NQD) compounds. In this compound, the NQD is hydrophobic and usually insoluble in aqueous alkaline solutions.
However, when irradiated with g- or i-rays, the NQD moiety is decomposed and converted into a hydrophilic compound. As a result, after irradiation, the resists can be dissolved in an alkaline developing solution.
In addition, positive photoresists for KrF lasers use chemically amplified photoresists, in which an acid is generated by the exposure and the catalytic reaction of the acid accelerates the change of the resists at the exposed area.
*Including some distributors, etc.
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Transene Company Inc., established in 1965 and headquartered in Danvers, Massachusetts, is a manufacturer of materials for electronics and aerospace industries. The company specializes in various materials, covering dielectrics, photoresist materials, and conformal coatings. It also provides chemical etchants, plating chemistries, and high-purity cleaning compounds. These products find extensive use in semiconductor microelectronics, electronic components, photonics, LED, and various electronic applications. The company collaborates on specialized material development and strives for environmental adherence by partnering with UMASS Lowell and the TURI institute to eliminate PFAS surfactants.
Eternal Technology Corporation, established in 1964 and based in Virginia, United States, is a manufacturer of various chemicals and materials for printed circuit boards. The company fabricates dry film photoresists, tin strips, antifoams, and equipment cleaners. It also makes dry film solder masks, developers, resist strips, and copper cleaners. Dry film photoresist is the key component used in the image transfer process and is used in precision etching and electroplating products. It serves two major industries, which are printed circuit board and photo chemical machining industries.
FUJIFILM Holdings America Corporation, founded in 1934 and located in Valhalla, New York, is a manufacturer of imaging and information solutions. The company is the regional headquarters for the Americas and is comprised of more than 20 affiliate companies spanning across a broad spectrum of industries, including medical and life sciences, electronics, chemicals, graphic arts, and information systems. Its industrial segments include data storage, electronic materials, chemicals, industrial testing products, and graphic arts products and services.
DuPont de Nemours, Inc., commonly shortened to DuPont, is an American multinational chemical manufacturer headquartered in Wilmington, Delaware, and established in 1802. The company offers adhesives and coatings for electronic components, commercial inkjet inks for printing solutions, surfacing materials and insulating foam sealants for building constructions, chromatography resins for protein purification, as well as lubricants and fluids for various electronic component applications. They also provide specialty enzymes and proteins for food production, thermal management materials, and microbial control products for industrial hygiene. DuPont serves various industries, including automotive, building and construction, energy, packaging and printing, as well as water management.
RBP Chemical Technology, Inc., founded in 1954, works as a distinguished manufacturer and supplier of intelligent chemistry solutions, catering primarily to the printing, medical, and PCB manufacturing sectors. The company offers a spectrum of offerings, from specialty development and analytical services to custom manufacturing. Branded as the Intelligent Choice, RBP Chemical Technology has gained industry name for its adeptness in recommending fitting products for various applications, ultimately resulting in optimal cost savings for clients. Operating from Milwaukee, Wisconsin, the company's unwavering voyage has solidified its position as a successful and effective industry pioneer.
Tokyo Ohka Kogyo America Inc., also known as TOK America, established in 1993 with headquarters and facilities in Hillsboro, Oregon, United States, is a manufacturer of photoresists, auxiliary chemicals, and semiconductor process equipment. The company produces tiny components, known as photoresists, to enable ultra-micro processing as well as specialty chemicals to enhance the capabilities of the semiconductor industry with advanced processing equipment and MEMS semiconductor packaging (manufacturing technology). It has also expanded its manufacturing into the medical space. The company also provides extensive toll manufacturing primarily related to complex liquid and powder development for custom production solutions.
KemLab Inc., founded in 2010 and headquartered in Woburn, Massachusetts, United States, is a manufacturer, distributor, and supplier of photosensitive imaging materials used in the electronics industry. The company's product portfolio comprises a wide range of photoresists, such as negative-tone photoresists designed for polymeric MEMS, microfluidics, and micromachining. These products are widely used for electronics manufacturing, personal device production, and industrial equipment. Its services include resist formulation support and customization, as well as consulting services for photoresists for advanced packaging, image reversal, and diffraction gratings.
Sono-Tek Corporation was established in 1975 and is headquartered in Milton, New York. The company specializes in precision ultrasonic coating solutions, serving diverse industries, including electronics, medical, and industrial. Its product range encompasses ultrasonic spray nozzles, coating systems, and fluxers. Sono-Tek's pioneering technology is evident through multiple patents and global market recognition such as the acquisition of ISO 9001: 2015. The company is also found in many other countries, with seven application labs and over 50 factory-trained distributors to add to its design and manufacturing headquarters in the US.
Merck KGaA was founded in 1668 and is a manufacturer of medical products and devices based in Darmstadt, Germany. The company manufactures various products such as erbitux, bavencio, tepmetko, glucophage, and eutyhrox. These products are used for various purposes such as general medicine treatments, cardiovascular diseases, childhood growth hormone deficiency, multiple sclerosis treatments, and merkel cell carcinoma. The company has obtained various certifications such as ISO 9001:2015, ISO 14001:2015, ISO 45001:2018, and ISO 50001:2018.
DIC, established in 1908 in Japan, is a manufacturer and supplier of printing inks, organic pigments, and PPS compounds. The company's product portfolio includes different printing inks, such as offset inks used for quality printing, gravure inks for packaging materials, and UV-curable inks for various applications. They also offer organic pigments used in automotive coatings, and PPS compounds, used in electronic and automotive components. DIC's products are used in industries like automotive, electronics, food, and housing. They provide quality products and services that meet societal needs while addressing local and global challenges.
JSR Corporation, established in 1957 and headquartered in Tokyo, Japan, is a manufacturer of lithography materials, CMP materials, process materials, and packaging materials. The company offers a wide range of products, including lithography materials, CMP materials, insulating materials, LCD materials, polymer alloys, and more. It also offers UV-curable resins, weather-resistant resin AES grade, acrylic emulsion, bioprocess materials, and LCD materials. Its photoresists for circuit formation enable the production of high-performance semiconductor devices. The company has achieved ISO 9001 certification for its quality management systems. It serves industries such as semiconductors, display, life sciences, plastic industry, and digital 3D industry.
Allresist GmbH, established in 1992 and headquartered in Strausberg, Germany, is a specialist manufacturer of resists used in various manufacturing processes. The company produces photoresists, process chemical resists, and resists for various electronics manufacturing processes, primarily associated with microelectronics manufacturing, although its products are also used in other industries such as construction and automotive component production. It stocks specialist chemicals and resists for lithography and protective coatings for structures, for example, but also welcomes custom requests from industry to develop new technologies.
Micro Resist Technology GmbH, established in 1993 and headquartered in Berlin, Germany, is a developer and manufacturer of photoresists, polymers, and photopolymers. The company's product line also includes complementary process chemicals for lithographic manufacturing processes in micro- and nanostructuring. These products are used for the manufacture of miniature electronic components, such as PC boards, as well as for the production of semiconductor chips. Its clients include original equipment manufacturers such as DuPont, Kayaku Advanced Materials, and DJ Microlaminates.
TOKYO OHKA KOGYO CO., LTD., established in 1962 and headquartered in Kawasaki, Japan, is a manufacturer of photoresist for semiconductors, semiconductor-assembling machines, auxiliary chemicals, and processing equipment. The company offers a range of products, including photoresist materials, photoresist ancillaries, surface modifiers, structure-forming materials, porous polyimide film, and more. These products cater to the semiconductor industry, addressing diverse needs for materials and equipment. The company also supplies materials that enable the creation of 3D structures and the execution of permanent bonding.
Shin-Etsu Chemical Co., Ltd., founded in 1926 in Japan, is a manufacturer and distributor of synthetic chemicals and electronic materials, such as semiconductor silicon and rare earth quartz. The company offers a wide range of products, including silicone sealants and rubbers, as well as cellulose derivatives used in foods and pharmaceuticals, and rare earth magnets. The company has four core business segments, including infrastructure chemicals, electronics materials, silicone-based functional agents, and specialized engineering for the development of plant design, construction, and maintenance.
MicroChemicals GmbH, established in 2001 and headquartered in Ulm, Germany, is a manufacturer of chemicals for structuring technologies and si-wafers, even in small quantities, for use by institutes, research centers, and in production facilities. The company's wide product range includes photoresists, ancillaries, and etching mixtures, which are used in semiconductor research and development. The company has direct distributors across Europe and also provides non-direct distribution through distribution partners in countries that include Australia, Israel, and Eastern Europe.
EV Group (EVG), established in 1980 in Austria, is a supplier of high-volume production equipment and process solutions for semiconductor, MEMS, compound semiconductor, power device, and nanotechnology device manufacturing. Its product range includes lithography systems, bonding systems, nanoimprint lithography (NIL) equipment, metrology systems, and photoresist coaters, vital in semiconductor manufacturing. The company have earned numerous accolades, including the 3D InCites Award, 2023 ISES Equipment Manufacturer of the Year Award, and known as one of the suppliers of fab equipment to foundation chip makers, emphasizing its excellence in the industry.
Nagase & Co., Ltd., been in business since 1832 and located in Tokyo, Japan, is a supplier of a wide array of chemicals and related products. The company distributes 3D printing materials, adhesives, active ingredients, epoxy resins, and gelling agents. It also sources etching agents, optical materials, moisturizing agents, recycled composite substrates, and potting compounds. Its 3D printing materials have high heat resistance, excellent moisture tolerance, ultraviolet curability, and broad compatibility. It serves various industries, including additive manufacturing, chemicals, healthcare and pharmaceuticals, personal care, and printing.
Ranking as of December 2024
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | Transene Company, Inc. |
12.9%
|
| 2 | FUJIFILM Holdings America Corporation |
8.0%
|
| 3 | Baoding Lucky Innovative Materials Co.,Ltd. |
6.7%
|
| 4 | Eternal Technology Corporation |
6.7%
|
| 5 | JSR Corporation. |
6.7%
|
| 6 | Great Eastern Resins Industrial Co. Ltd. |
6.3%
|
| 7 | DuPont. |
5.8%
|
| 8 | KemLab Inc. |
4.9%
|
| 9 | RBP Chemical Technology Inc. |
4.9%
|
| 10 | Nagase ChemteX America LLC |
4.0%
|
Derivation Method
The ranking is calculated based on the click share within the resist page as of December 2024. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
Newly Established Company
Company with a History
*Including some distributors, etc.
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
|
United States of America
|
10 | 43.5% |
|
Japan
|
6 | 26.1% |
|
Germany
|
4 | 17.4% |
|
Austria
|
1 | 4.3% |
China
|
1 | 4.3% |
Taiwan
|
1 | 4.3% |
13 products found
13 products
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■What is VPA? ・Negative type resist that exhibits strong adhesion even after pattern formation ・Easily removable by laser ablation ・Cured film e...
