SAKIGAKE-Semiconductor's Plasma Cleaning Systems

7 registered Plasma Cleaning Systems of SAKIGAKE-Semiconductor

SAKIGAKE-Semiconductor

Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G

A vacuum plasma device that can introduce various gases. Gas flow adjustment, power adjustment, and vacuum monitor You can set the precise processi...

1 model listed

SAKIGAKE-Semiconductor

Vacuum tabletop vacuum plasma device YHS-R

It is a compact and inexpensive specification. Surface treatment treatment before the formation of thin film formation before coating before coatin...

1 model listed

SAKIGAKE-Semiconductor

Vacuum and small vacuum plasma device NMR-GTS

For surface modification and cleaning of boards, fiber, and film -shaped objects. For bonding, printing, and coating preprocessing. For pre -treatm...

1 model listed

SAKIGAKE-Semiconductor

Powder treatment Small rotation type vacuum plasma device MUG-80

■ Product overview ･ Introduced a rotating stirring mechanism in the vacuum chamber ･ Dry type and full -length processing ･ Stir during glow disch...

1 model listed

SAKIGAKE-Semiconductor

Powdered body processing rotary table vacuum plasma device YHS-Dφs

Ideal for processing powder and chip capacitors. A rotating mechanism has been added to the vacuum plasma so that the entire surface can be process...

1 model listed

SAKIGAKE-Semiconductor

High -frequency power supply large capacity vacuum plasma device SCB series

■ Product overview ･ Multi -stage electrode mass processing ･ Change the electrode structure to support various containers ･ One button operation i...

1 model listed

SAKIGAKE-Semiconductor

High-frequency power supply vacuum plasma device US-80A

Up to 80 plasma processing is possible with a maximum of 500ml bottles at a time. By replacing the electrode, it supports bottles with various capa...