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SAKIGAKE-Semiconductor's Plasma Cleaning Systems

SAKIGAKE-Semiconductor

7 products found

SAKIGAKE-Semiconductor

Powder treatment Small rotation type vacuum plasma device MUG-80

280+ people viewing

Last viewed: 1 hour ago

■ Product overview ・ Introduced a rotating stirring mechanism in the vacuum chamber ・ Dry type and full -length processing ・ Stir during glow disch...

SAKIGAKE-Semiconductor

Vacuum and small vacuum plasma device NMR-GTS

390+ people viewing

Last viewed: 9 hours ago

For surface modification and cleaning of boards, fiber, and film -shaped objects. For bonding, printing, and coating preprocessing. For pre -treatm...

SAKIGAKE-Semiconductor

High -frequency power supply large capacity vacuum plasma device SCB series

310+ people viewing

Last viewed: 19 hours ago

■ Product overview ・ Multi -stage electrode mass processing ・ Change the electrode structure to support various containers ・ One button operation i...

SAKIGAKE-Semiconductor

High-frequency power supply vacuum plasma device US-80A

380+ people viewing

Last viewed: 1 day ago

Up to 80 plasma processing is possible with a maximum of 500ml bottles at a time. By replacing the electrode, it supports bottles with various capa...

SAKIGAKE-Semiconductor

Powdered body processing rotary table vacuum plasma device YHS-Dφs

370+ people viewing

Last viewed: 18 hours ago

Ideal for processing powder and chip capacitors. A rotating mechanism has been added to the vacuum plasma so that the entire surface can be process...

SAKIGAKE-Semiconductor

Vacuum gas introduced type vacuum plasma device YHS-G vacuum gas introduction type vacuum plasma device YHS-G

420+ people viewing

Last viewed: 1 day ago

A vacuum plasma device that can introduce various gases. Gas flow adjustment, power adjustment, and vacuum monitor You can set the precise processi...

SAKIGAKE-Semiconductor

Vacuum tabletop vacuum plasma device YHS-R

430+ people viewing

Last viewed: 19 hours ago

It is a compact and inexpensive specification. Surface treatment treatment before the formation of thin film formation before coating before coatin...


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