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  4. High-density plasma etching equipment for research and development NE-550EX (ULVAC Sales Co., Ltd.)
High-density plasma etching equipment for research and development NE-550EX-NE-550EX
High-density plasma etching equipment for research and development NE-550EX-ULVAC Sales Co., Ltd.

High-density plasma etching equipment for research and development NE-550EX
ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

125.8hours

About This Product

■Summary

The high-density plasma etching system NE-550EX for research and development is a magnetic field ICP (ISM=Inductively Super Magnetron) type high-density plasma etching system, single-wafer type, and equipped with an LL chamber as standard, making it compact and low-priced. .

■Applications

・Compound materials (LEDs, LDs, high frequency devices and power devices). ・Processing of electrodes, metal wiring, organic films, ceramics, etc. - For processing difficult-to-etch materials such as ferroelectrics, noble metals, and magnetic films. ・Nanoimprint, NEMS, MEMS, various sensors. ・Biochips, microfluidic devices, photonic crystals, etc.

■Features

・With magnetic field assist, it can generate lower pressure, lower electron temperature, and higher density plasma than other ICP methods, and a wide range of plasma control from ionic etching to radical etching is possible, so it can be used in a variety of processes as a development tool. - Equipped with a "star electrode" to prevent deposits from adhering to the RF input window. The device also has a heating function and is designed with an emphasis on reproducibility and stability. ・Achieves reliability as a research and development tool, such as a highly reliable transport robot, simple device structure, and easy maintenance. - Abundant optional functions, cassette chamber can be added. ・NE-5700 and NE-7800, which are compatible with multi-chambers configured with the same chamber, are available for mass production lines.

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    High-density plasma etching equipment for research and development NE-550EX

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1 Models of High-density plasma etching equipment for research and development NE-550EX

Image Part Number Price (excluding tax) In-plane/inter-plane uniformity Operating pressure (Pa) Substrate temperature control Board size System configuration
High-density plasma etching equipment for research and development NE-550EX-Part Number-NE-550EX

NE-550EX

Available upon quote

±3% max.

0.07~6.7

Electrostatic chuck

~150mm

Research and development/prototype equipment + Load Lock room

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About Company Handling This Product

ULVAC Sales Co., Ltd.

Response Rate

100.0%

Response Time

125.8hrs

  • Japan

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