High-density plasma etching equipment for research and development NE-550EX
ULVAC Sales Co., Ltd.
ULVAC Sales Co., Ltd.'s Response Status
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About This Product
■Summary
The high-density plasma etching system NE-550EX for research and development is a magnetic field ICP (ISM=Inductively Super Magnetron) type high-density plasma etching system, single-wafer type, and equipped with an LL chamber as standard, making it compact and low-priced. .
■Applications
・Compound materials (LEDs, LDs, high frequency devices and power devices).
・Processing of electrodes, metal wiring, organic films, ceramics, etc.
- For processing difficult-to-etch materials such as ferroelectrics, noble metals, and magnetic films.
・Nanoimprint, NEMS, MEMS, various sensors.
・Biochips, microfluidic devices, photonic crystals, etc.
■Features
・With magnetic field assist, it can generate lower pressure, lower electron temperature, and higher density plasma than other ICP methods, and a wide range of plasma control from ionic etching to radical etching is possible, so it can be used in a variety of processes as a development tool.
- Equipped with a "star electrode" to prevent deposits from adhering to the RF input window. The device also has a heating function and is designed with an emphasis on reproducibility and stability.
・Achieves reliability as a research and development tool, such as a highly reliable transport robot, simple device structure, and easy maintenance.
- Abundant optional functions, cassette chamber can be added.
・NE-5700 and NE-7800, which are compatible with multi-chambers configured with the same chamber, are available for mass production lines.
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Product
High-density plasma etching equipment for research and development NE-550EX
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Handling Company
ULVAC Sales Co., Ltd.
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Categories
1 Models of High-density plasma etching equipment for research and development NE-550EX
| Product Image | Part Number | Price (excluding tax) | Board size | In-plane/inter-plane uniformity | Operating pressure (Pa) | Substrate temperature control | System configuration |
|---|---|---|---|---|---|---|---|
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NE-550EX |
Available upon quote | ~150mm | ±3% max. | 0.07~6.7 | Electrostatic chuck | Research and development/prototype equipment + Load Lock room |
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About Company Handling This Product
- Japan