NLD dry etching equipment for research and development NLD-570
ULVAC Sales Co., Ltd.
ULVAC Sales Co., Ltd.'s Response Status
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100.0%
Response Time
125.8hours
About This Product
■Summary
NLD dry etching for research and development NLD-570 is a dry etching system equipped with low pressure, low electron temperature, and high density plasma using magnetic neutral line plasma (NLD), which was originally developed by ULVAC.
■Applications
Optical devices (diffraction gratings, modulators, optical waveguides, optical switches, etc.), uneven microlenses, photonic crystals, fluid path (μ-TAS) creation, etc.
■Features
・NLD uses lower pressure, higher density, and lower electron temperature plasma than the ICP method, so it is suitable for processing quartz, glass, crystal, LN, LT substrates, etc.
・Glass processing with many impurities such as Pyrex and borosilicate glass can be etched with excellent shape and surface smoothness.
・Thick film resist can be used as a mask for deep etching (100μm or more) of quartz and glass.
・High-speed etching possible (Quartz>1μ m/min, Pyrex>0.8μ m/min)
・Cassette chamber can be added.
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Product
NLD dry etching equipment for research and development NLD-570
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Handling Company
ULVAC Sales Co., Ltd.
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Categories
1 Models of NLD dry etching equipment for research and development NLD-570
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
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NLD-570 |
Available upon quote |
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About Company Handling This Product
- Japan