Dry etching equipment for opto devices and MEMS NLD-5700
ULVAC Sales Co., Ltd.
About This Product
■Summary
The NLD-5700 dry etching system for opto-devices and MEMS is a dry etching system for mass production equipped with a magnetic neutral line plasma (NLD) source. (Dry etching equipment equipped with low pressure, low electron temperature, and high density plasma using magnetic neutral line plasma (NLD), which was originally developed by ULVAC.)
■Applications
・Optical devices (diffraction gratings, modulators, optical waveguides, optical switches, etc.), concave-convex microlenses.
・Fluid path creation (μ-TAS) and photonic crystals.
■Features
・Can be expanded to 2 rooms (NLD, magnetic field ICP, CCP, and ashing room) by working inside the clean room.
・Dry cleaning is easy because NLD is a plasma that can be controlled in space and time.
・Achieves easy chamber maintenance.
・Providing process solutions from mask etching to quartz and glass etching.
・Perfect process support system provided by the Semiconductor Technology Research Institute.
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Product
Dry etching equipment for opto devices and MEMS NLD-5700
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Handling Company
ULVAC Sales Co., Ltd.
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Categories
1 Models of Dry etching equipment for opto devices and MEMS NLD-5700
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
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NLD-5700 |
Available upon quote |
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About Company Handling This Product
- Japan