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  4. CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma (Microphase Co., Ltd.)
CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma-MPCVD-Plasma
CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma-Microphase Co., Ltd.

CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma
Microphase Co., Ltd.

About This Product

Facilitates gas ionization and precursor decomposition

■Summary

・By generating high-frequency induced plasma upstream of the horizontal tube furnace thermal CVD equipment, the ionization of the input gas or precursor is promoted and the reaction efficiency in the thermal CVD zone is increased. ・We will manufacture it according to your desired purpose, so please contact us for details.

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    CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma

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1 Models of CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma

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CVD equipment RF plasma assisted CVD equipment MPCVD-Plasma-Part Number-MPCVD-Plasma

MPCVD-Plasma

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About Company Handling This Product

Microphase Co., Ltd.

Company Overview

Microphase Co. Ltd., established in 1999 and headquartered in Ibaraki, Japan, is a manufacturer of nanotechnol...

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  • Japan

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