Ion sputtering equipment G20
HiSOL,Inc.
About This Product
■Easy sputtering with low current without using any inert gas
This tabletop sputtering device is ideal for applying antistatic coatings to the surface of samples, such as when performing SEM observation of non-conductive samples. The sophisticated, compact design and simple UI with touch panel ensure comfortable operability.
■Summary
・No inert gas required
・Execute everything from vacuuming to coating with one touch
・Save conditions to library (maximum 10)
・Up to 7 samples can be processed simultaneously
・Reduced damage to samples due to low current
・Forming with Au,Ag,Pt (maximum 50mmφ)
・Can be used immediately with a set of main body + pump + 1 target
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Product
Ion sputtering equipment G20
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Handling Company
HiSOL,Inc.
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Categories
1 Models of Ion sputtering equipment G20
| Product Image | Part Number | Price (excluding tax) | Body weight | Chamber size | Compatible sample size | External dimensions | Ionic current | Power supply | Sputtering time | Target material |
|---|---|---|---|---|---|---|---|---|---|---|
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G20 |
Available upon quote | 10kg | 140mmφ (H100mm) | 50mmφ (H30mm) | 350×210mm (H230mm) | 1~10mA (1mA/step) | 110V±10%, 50/60Hz |
1~600 seconds (1sec/step) *About 15nm molding at 10mA for 100 seconds |
Au, Ag, Pt (50mmφ / 99.99%) |
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About Company Handling This Product
- Japan