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High pressure pulse plasma CVD equipment-High pressure pulse plasma CVD equipment
High pressure pulse plasma CVD equipment-MPS Co., Ltd.

High pressure pulse plasma CVD equipment
MPS Co., Ltd.

MPS Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

86.1hours


About This Product

■Summary

This is a plasma CVD device for diamond-like carbon that uses DC high-voltage pulse discharge. Methane or acetylene can be selected as the raw material gas.

  • Product

    High pressure pulse plasma CVD equipment

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1 Models of High pressure pulse plasma CVD equipment

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High pressure pulse plasma CVD equipment-Part Number-High pressure pulse plasma CVD equipment

High pressure pulse plasma CVD equipment

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About Company Handling This Product

Response Rate

100.0%


Response Time

86.1hrs

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