This is a sputtering device for forming metal films. Up to four 4-inch circular magnetron cathodes can be installed. This device is equipped with an unbalanced magnetron, a strong magnetic field balanced magnetron, and a variable magnetic field magnetron.
When it comes to experimental sputtering equipment, we will propose the best equipment to suit your performance requirements and budget. Depending on your budget, it is also possible to use supplied or second-hand items.
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