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  4. Thermal + plasma CVD equipment (MPS Co., Ltd.)

Thermal + plasma CVD equipment
MPS Co., Ltd.

MPS Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

86.1hours

About This Product

■Summary

This is an experimental device for making nitrides. The raw materials used are chloride and ammonia. For film formation, you can choose between thermal CVD using halogen lamp heating or plasma CVD using inductively coupled plasma. It is also possible to use both methods together.

  • Product

    Thermal + plasma CVD equipment

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About Company Handling This Product

MPS Co., Ltd.

Response Rate

100.0%

Response Time

86.1hrs

  • Japan

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Plasma-Enhanced CVD
Plasma-Enhanced CVD　MPS Co., Ltd.
MPS Co., Ltd.

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