Thermal + plasma CVD equipment-Thermal + plasma CVD equipment
Thermal + plasma CVD equipment-MPS Co., Ltd.

Thermal + plasma CVD equipment
MPS Co., Ltd.


About This Product

■Summary This is an experimental device for making nitrides. The raw materials used are chloride and ammonia. For film formation, you can choose between thermal CVD using halogen lamp heating or plasma CVD using inductively coupled plasma. It is also possible to use both methods together.

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    Thermal + plasma CVD equipment

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1 Models of Thermal + plasma CVD equipment

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Thermal + plasma CVD equipment-Part Number-Thermal + plasma CVD equipment

Thermal + plasma CVD equipment

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