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Compact sputtering equipment for research and development FDS/FRS SeriesHandling Company
FKD Factory Co., Ltd.Categories
| Image | Part Number | Price (excluding tax) | High vacuum specification (turbo molecular pump added) vacuum gauge | High vacuum specification (turbo molecular pump added) Pumping speed | High vacuum specification (turbo molecular pump added) model | High vacuum specification (turbo molecular pump added) Ultimate pressure | High vacuum specification (turbo molecular pump added) Gas pressure adjustment | Sample size | Installation type | Vacuum gauge | Vacuum exhaust system | External dimensions | Addition of reactive sputtering specifications Flow rate | Addition of reactive sputtering specifications Model number | Added reactive sputtering specifications Gas type | Power supply used | Spare port | Target | Sputter power supply | Sputter method | Gas flow adjustment | Gas introduction | Cathode | Added RF sputter specifications Oscillation frequency | RF sputtering specifications added Model number | Addition of 2-source magnetron cathode model | 2-source specification magnetron cathode addition specifications |
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FDS/FRS Series |
Available upon quote |
Full range gauge |
35L/s |
OS-HVS |
≦5×10-4Pa |
Butterfly valve |
Maximum Φ2 inch/Small sample size possible |
Tabletop type |
Pirani Gauge/5.0×10^-2Pa~1.0×10^5Pa |
Rotary pump 162L/min |
W480×D510×H440mm *Protrusions not included |
5sccm |
OS-AGS |
O2 or N2 |
AC100V/15A 1 system |
NW40×2 |
Au/Ag/Pt/Pd/Ni/Cu/W/Cr/Ti/Ta/Mo/etc. |
DC500V/0.8A |
DC magnetron sputtering/depot up |
MFC/20sccm for argon |
1/4 inch Swagelok |
Φ2 inch/magnetron cathode |
13.56MHz |
OS-RFS |
OS-2CS |
Two-source sputtering |
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