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  4. Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD (Oxford Instruments Ltd.)
Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD-PlasmaPro 100 Nano CVD
Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD-Oxford Instruments Ltd.

Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD
Oxford Instruments Ltd.

Oxford Instruments Ltd.'s Response Status

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About This Product

Chemical vapor deposition (CVD) and plasma enhanced CVD (PECVD) are suitable tools for the growth of 1D and 2D nanomaterials and the formation of heterojunctions. The PlasmaPro 100 Nano (formerly Nanofab) delivers high deposition properties for nanomaterials through temperature control up to 1,200°C, in-situ catalyst activation, and tight process control.

■Features

・Excellent homogeneity due to flexible temperature control up to 1,200℃ ・Optional 700℃, 800℃, 1,200℃ table heater ・Maximum sample size is 200mm ・Vacuum load lock – quick sample exchange ・Uniform raw material precursor supply achieved by cooling wall design using shower head Optional liquid/solid feed system for deposition of MoS2, MoSe2, and other TMDCs (transition metal dichalcogenides)

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    Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD

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1 Models of Achieving high film formation characteristics of nanomaterials PlasmaPro 100 Nano CVD

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PlasmaPro 100 Nano CVD

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