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  4. ICPCVD Process Module PlasmaPro 100 ICPCVD (Oxford Instruments Ltd.)
ICPCVD Process Module PlasmaPro 100 ICPCVD-PlasmaPro 100 ICPCVD
ICPCVD Process Module PlasmaPro 100 ICPCVD-Oxford Instruments Ltd.

ICPCVD Process Module PlasmaPro 100 ICPCVD
Oxford Instruments Ltd.

About This Product

The ICPCVD (Inductively Coupled Plasma) process module is designed to produce high-quality thin films at low temperatures and uses a high-density remote plasma to achieve superior thin film properties with less damage.

■Features

・Excellent homogeneity, high throughput, and high precision process ・High quality thin film ・Wide electrode temperature range ・Suitable for all wafers up to 200mm ・Quick exchange of wafers of different sizes ・Low cost of ownership and easy maintenance ・Supports compact and flexible layout ・Up to 400℃ or 1200℃ possible with resistance heating electrode ・In situ chamber cleaning and end point detection possible ・Equipped with a flexible gas phase supply module, capable of thin film deposition using liquid precursors such as TiO2 using TTIP and SiO2 using TEOS.

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    ICPCVD Process Module PlasmaPro 100 ICPCVD

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1 Models of ICPCVD Process Module PlasmaPro 100 ICPCVD

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ICPCVD Process Module PlasmaPro 100 ICPCVD-Part Number-PlasmaPro 100 ICPCVD

PlasmaPro 100 ICPCVD

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Oxford Instruments Ltd.

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