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  4. Low pressure RF sputtering equipment HVS-03 (Epiquest Co., Ltd.)
Low pressure RF sputtering equipment HVS-03-HVS-03
Low pressure RF sputtering equipment HVS-03-Epiquest Co., Ltd.

Low pressure RF sputtering equipment HVS-03
Epiquest Co., Ltd.

About This Product

By using a sputter gun compatible with high vacuum, it is possible to form thin films even at 10-2Pa levels. It is possible to install sputter guns up to 5 yuan.

  • Product

    Low pressure RF sputtering equipment HVS-03

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1 Models of Low pressure RF sputtering equipment HVS-03

Image Part Number Price (excluding tax) RF control power supply Z-axis movement mechanism Low pressure RF sputter gun target size Ultimate pressure Heating method Heating temperature Board size Substrate rotation mechanism Charge chamber ultimate pressure Loading room Board transfer
Low pressure RF sputtering equipment HVS-03-Part Number-HVS-03

HVS-03

Available upon quote

300W, 13.56MHz, auto-tuning type

±20mm

2 inch rotating shutter mechanism

6.5×10^-6Pa

Substrate heating method

MAX.700℃

Φ3 inch x 1 piece

Max.20rpm

6.5×10^-5Pa

Manual transfer rod method

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Epiquest Co., Ltd.

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