"DEX" Pad Dressa for polishing pads
TOKYO DIAMOND TOOLS MFG.CO.,LTD.
About This Product
By sticking the selected diamond abrasive grain to the platform, a stable dressing is realized with little individual differences. Active in the dressing of the polishing pad used in the flattening process of semiconductor devices.
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Product
"DEX" Pad Dressa for polishing pads
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Handling Company
TOKYO DIAMOND TOOLS MFG.CO.,LTD.
1 Models of "DEX" Pad Dressa for polishing pads
| Product Image | Part Number | Price (excluding tax) | Abrasive grain | Base accuracy | Base coating | Base material | Bond type | Dresser outer diameter | Electrodes | Granularity |
|---|---|---|---|---|---|---|---|---|---|---|
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DEX Pad Dressa |
Available upon quote | Diamond (blocky type) | Plan degree ≦ 0.3 set tolerance ≦ 0.05 | Teflon coating available, nor | SUS304, SUS420 | Electricity | ~ φ740D (29B) | One side, both sides | #60 ~#400 |
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