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  3. Plasma-Enhanced CVD
  4. Plasma CVD experimental equipment PCVD-R100 (Arios Co., Ltd.)
Plasma CVD experimental equipment PCVD-R100-PCVD-R100
Plasma CVD experimental equipment PCVD-R100-Arios Co., Ltd.

Plasma CVD experimental equipment PCVD-R100
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response

About This Product

■Summary

CVD is an abbreviation for Chemical Vapor Deposition, and refers to the process of supplying a raw material with gas, decomposing it with plasma or heat, and forming a film using the components. There are various methods, but the most commonly used are those that use heat or plasma. There are various types of plasma generation depending on the frequency. Arios designs and manufactures various plasma CVD equipment. For details, please refer to Microwave (2.45GHz) vsRF (13.56MHz). This equipment is a plasma CVD equipment compatible with experimental MO raw materials, and is equipped with an RF plasma source, substrate heating mechanism, gas supply system, load lock chamber, etc., and is capable of plasma processing various raw material gases to form thin films on substrates. is.

■Features

- Utilizes Arios' high vacuum technology, allowing film deposition experiments in a clean vacuum. - Compact chamber + simple configuration allows for easy maintenance. - The substrate heating mechanism is made of materials with excellent heat resistance and gas resistance, allowing stable heating for long periods of time. - Board installation can be done extremely easily and in a short time without exposing to the atmosphere due to the load lock mechanism.

■Options

・MO gas supply system ・Parallel plate electrode + shower head

  • Product

    Plasma CVD experimental equipment PCVD-R100

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1 Models of Plasma CVD experimental equipment PCVD-R100

Image Part Number Price (excluding tax) Vacuum exhaust system Utility Main body stand Substrate heating mechanism Board size Reaction chamber Load lock chamber Plasma source Gas supply system
Plasma CVD experimental equipment PCVD-R100-Part Number-PCVD-R100

PCVD-R100

Available upon quote

Load lock room: TMP+RP
Reaction chamber: RP + trap

Three-phase AC200V 60A
Single phase AC100V 10A
Cooling water 1 L⁄min

With casters and adjusters

Maximum heating temperature: 900℃
Board position: variable up and down
Power supply: DC power supply + temperature controller

~φ100

Made of SUS 304

Made of SUS 304
Hatch port + O-ring type transfer rod

RF: 0~500W variable + automatic matching BOX (inductive coupling or capacitive coupling)
Reaction tube: φ40×36 quartz tube

MFC + valves

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About Company Handling This Product

Arios Co., Ltd.

Response Rate

100.0%

Response Time

1.7hrs

  • Japan

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