All Categories

History

Small sputtering equipment SS-DC RF301-SS-DC RF301
Small sputtering equipment SS-DC RF301-Arios Co., Ltd.

Small sputtering equipment SS-DC RF301
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response


About This Product

■Summary

Small sputtering equipment SS-DC RF301 This is a film forming equipment that uses sputtering (often abbreviated as sputtering). A feature of sputtering film formation is that the particles that fly to the substrate have relatively high energy, making it possible to create a strong film with high adhesion. On the other hand, since plasma is created using argon or other materials and this acts on the substrate, problems such as roughening of the substrate surface may occur. This device is a small sputtering device equipped with one 2" magnetron cathode and one substrate heating mechanism. All functions are packed into a JIS rack size in pursuit of space saving and ease of use. In addition, it is a UHV with an exchange room. Compatible types of sputtering equipment are also available.

■Features

・Although it is small, it has specifications and performance equivalent to full-scale sputtering equipment. - Compact, lightweight, and simple design allows installation in approximately half the space of an office desk. - The distance between the target and the board can be set arbitrarily using the board up/down mechanism. ・Substrate heating can be performed at high temperatures. - Equipped with a chiller as standard, it can be operated using only electricity and gas. - The flanges are compatible and can be rearranged into sputter-up and sputter-down. - Either DC or RF can be selected as the sputtering power source.

  • Product

    Small sputtering equipment SS-DC RF301

Share this product


100+ people viewing

Last viewed: 3 hours ago


Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of Small sputtering equipment SS-DC RF301

Image Part Number Price (excluding tax) Weight Vacuum gauge Utility power Utilities Nitrogen gas (for purge) Utility Process gas Main body stand Exhaust system Substrate heating temperature Board up/down mechanism Board stage Ultimate pressure Leak amount Size Gas supply system Cathode power supply Cathode cooling method Cathode target material Cathode target size Cathode
Small sputtering equipment SS-DC RF301-Part Number-SS-DC RF301

SS-DC RF301

Available upon quote

Approximately 100kg

Full range vacuum gauge (cold cathode + Pirani gauge)

AC200V single phase 20A)

0.05~0.1 MPa (1/4 SwagelokTM or 1/4 VCRTM)

Ar (1/4 SwagelokTM or 1/4 VCRTM)

With caster adjuster

TMP + diaphragm pump

MAX 500℃ (MAX 800℃ available as an option)

Stroke 100mm Manual operation O-ring shaft seal

2 inch compatible stage

3×10^-4 Pa or less

1×10^-8 Pa・m^3/sec or less (excluding O-ring transmission)

W540×D600 H1280 (excluding connector parts, etc.)

MFC1 system (Ar) 1/4 SwagelokTM or VCRTM connection

DC output 500W or RF output 300W

Water-cooled (equipped with chiller)

Various mechanical chuck methods or bonding methods

2 inches

Magnetron cathode

Customers who viewed this product also viewed

Reviews shown here are reviews of companies.

See More Sputtering Equipment Products

Other products of Arios Co., Ltd.

Reviews shown here are reviews of companies.


View more products of Arios Co., Ltd.

About Company Handling This Product

Response Rate

100.0%


Response Time

1.7hrs

  • Japan

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2024 Metoree