Small sputtering equipment SS-DC RF301
Arios Co., Ltd.
About This Product
■Summary
Small sputtering equipment SS-DC RF301 This is a film forming equipment that uses sputtering (often abbreviated as sputtering). A feature of sputtering film formation is that the particles that fly to the substrate have relatively high energy, making it possible to create a strong film with high adhesion. On the other hand, since plasma is created using argon or other materials and this acts on the substrate, problems such as roughening of the substrate surface may occur.
This device is a small sputtering device equipped with one 2" magnetron cathode and one substrate heating mechanism. All functions are packed into a JIS rack size in pursuit of space saving and ease of use. In addition, it is a UHV with an exchange room. Compatible types of sputtering equipment are also available.
■Features
・Although it is small, it has specifications and performance equivalent to full-scale sputtering equipment.
- Compact, lightweight, and simple design allows installation in approximately half the space of an office desk.
- The distance between the target and the board can be set arbitrarily using the board up/down mechanism.
・Substrate heating can be performed at high temperatures.
- Equipped with a chiller as standard, it can be operated using only electricity and gas.
- The flanges are compatible and can be rearranged into sputter-up and sputter-down.
- Either DC or RF can be selected as the sputtering power source.
-
Product
Small sputtering equipment SS-DC RF301
-
Handling Company
Arios Co., Ltd.
-
Categories
1 Models of Small sputtering equipment SS-DC RF301
| Product Image | Part Number | Price (excluding tax) | Board stage | Board up/down mechanism | Cathode | Cathode cooling method | Cathode power supply | Cathode target material | Cathode target size | Exhaust system | Gas supply system | Leak amount | Main body stand | Size | Substrate heating temperature | Ultimate pressure | Utilities Nitrogen gas (for purge) | Utility Process gas | Utility power | Vacuum gauge | Weight |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
|
SS-DC RF301 |
Available upon quote | 2 inch compatible stage | Stroke 100mm Manual operation O-ring shaft seal | Magnetron cathode | Water-cooled (equipped with chiller) | DC output 500W or RF output 300W | Various mechanical chuck methods or bonding methods | 2 inches | TMP + diaphragm pump | MFC1 system (Ar) 1/4 SwagelokTM or VCRTM connection | 1×10^-8 Pa・m^3/sec or less (excluding O-ring transmission) | With caster adjuster | W540×D600 H1280 (excluding connector parts, etc.) | MAX 500℃ (MAX 800℃ available as an option) | 3×10^-4 Pa or less | 0.05~0.1 MPa (1/4 SwagelokTM or 1/4 VCRTM) | Ar (1/4 SwagelokTM or 1/4 VCRTM) | AC200V single phase 20A) | Full range vacuum gauge (cold cathode + Pirani gauge) | Approximately 100kg |
Customers who viewed this product also viewed
![[MiniLab-GB] Glove box thin film experimental device MiniLab-026-GB-](https://metoree.s3.ap-northeast-1.amazonaws.com/img/products-new/3007428202411173.png)
Other products of Arios Co., Ltd.
View more products of Arios Co., Ltd.
About Company Handling This Product
- Japan