MP-CVD equipment for diamond synthesis DCVD-301B/601B
Arios Co., Ltd.
About This Product
■Summary
This equipment is a microwave plasma CVD equipment for diamond production. By making full use of our unique plasma technology, we have achieved large-area and high-speed growth. We will meet your production machine needs. Compatible with substrates up to 2 inches, allowing homoepitaxial growth and heteroepitaxial growth.
Our lineup also includes the DCVD151 series, a CVD system for single-crystal diamond synthesis that allows high-purity diamond synthesis experiments, and the HFCVD series, an HF-CVD system for diamond synthesis that uses the hot filament CVD method.
■Features
・Unique structure that prevents plasma from coming into contact with the chamber walls enables semiconductor-grade, single-crystal, high-purity diamond synthesis
・Special dome-shaped chamber + special electrode realizes highly efficient power-saving operation and high-speed growth.
・Operation is possible while directly observing the discharge state and board from the viewport.
・Achieve stable processes with our unique automatic pressure controller (APC)
・Supports processing of one 2-inch substrate or multiple diamond substrates
■Options
・Gas system added (up to 7 systems)
・Automatic control (recipe operation)
・Microwave automatic matching device (DCVD-301B)
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Product
MP-CVD equipment for diamond synthesis DCVD-301B/601B
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Handling Company
Arios Co., Ltd.
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Categories
1 Models of MP-CVD equipment for diamond synthesis DCVD-301B/601B
| Product Image | Part Number | Price (excluding tax) | Board size (maximum) | Chamber configuration | Chamber material/shape | Compressed air | Control method | Exhaust system | Gas supply system | Leak amount | Main body stand | Microwave | Microwave power supply method | Pressure adjustment | Process gas | Sample holder size | Substrate heating method | Temperature measurement | Ultimate vacuum | Utility power | Vacuum gauge |
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DCVD-301B |
Available upon quote | □5mm x 7 pieces or φ1 inch x 1 piece | 1 chamber | Special dome-shaped chamber made of aluminum | 0.5MPa | Touch panel (manual) | Mechanical booster pump + dry pump + turbo molecular pump | MFC5 systems (H2, CH4, N2, O2, Ar), up to 7 systems | 1.0×10^-8Pa・m^3/s or less (excluding O-ring transmission) | With casters and adjusters (including power supply), weight approximately 250kg | 0~3kW continuously variable (2.45GHz) + manual matching box | Antenna feeding type (also serves as sample stage) | Automatic pressure controller (APC) | H2, CH4, N2, O2, Ar (1/4" Swagelok or 1/4" VCR) | Φ27mm | Plasma heating: MAX1,200℃, internal water cooling | Radiation thermometer | 1×10^-1Pa or less | [Body] AC200V three-phase 30A [Chiller] AC200V single-phase 15A *DCVD-301B | Pirani vacuum gauge + full range vacuum gauge + diaphragm vacuum gauge (for APC) |
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About Company Handling This Product
- Japan