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MP-CVD equipment for diamond synthesis DCVD-301B/601B-DCVD-301B
MP-CVD equipment for diamond synthesis DCVD-301B/601B-Arios Co., Ltd.

MP-CVD equipment for diamond synthesis DCVD-301B/601B
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response


About This Product

■Summary

This equipment is a microwave plasma CVD equipment for diamond production. By making full use of our unique plasma technology, we have achieved large-area and high-speed growth. We will meet your production machine needs. Compatible with substrates up to 2 inches, allowing homoepitaxial growth and heteroepitaxial growth. Our lineup also includes the DCVD151 series, a CVD system for single-crystal diamond synthesis that allows high-purity diamond synthesis experiments, and the HFCVD series, an HF-CVD system for diamond synthesis that uses the hot filament CVD method.

■Features

・Unique structure that prevents plasma from coming into contact with the chamber walls enables semiconductor-grade, single-crystal, high-purity diamond synthesis ・Special dome-shaped chamber + special electrode realizes highly efficient power-saving operation and high-speed growth. ・Operation is possible while directly observing the discharge state and board from the viewport. ・Achieve stable processes with our unique automatic pressure controller (APC) ・Supports processing of one 2-inch substrate or multiple diamond substrates

■Options

・Gas system added (up to 7 systems) ・Automatic control (recipe operation) ・Microwave automatic matching device (DCVD-301B)

  • Product

    MP-CVD equipment for diamond synthesis DCVD-301B/601B

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1 Models of MP-CVD equipment for diamond synthesis DCVD-301B/601B

Image Part Number Price (excluding tax) Sample holder size Vacuum gauge Utility power Temperature measurement Main body stand Exhaust system Substrate heating method Board size (maximum) Compressed air Pressure adjustment Control method Ultimate vacuum Leak amount Microwave power supply method Microwave Process gas Chamber configuration Chamber material/shape Gas supply system
MP-CVD equipment for diamond synthesis DCVD-301B/601B-Part Number-DCVD-301B

DCVD-301B

Available upon quote

Φ27mm

Pirani vacuum gauge + full range vacuum gauge + diaphragm vacuum gauge (for APC)

[Body] AC200V three-phase 30A [Chiller] AC200V single-phase 15A *DCVD-301B

Radiation thermometer

With casters and adjusters (including power supply), weight approximately 250kg

Mechanical booster pump + dry pump + turbo molecular pump

Plasma heating: MAX1,200℃, internal water cooling

□5mm x 7 pieces or φ1 inch x 1 piece

0.5MPa

Automatic pressure controller (APC)

Touch panel (manual)

1×10^-1Pa or less

1.0×10^-8Pa・m^3/s or less (excluding O-ring transmission)

Antenna feeding type (also serves as sample stage)

0~3kW continuously variable (2.45GHz) + manual matching box

H2, CH4, N2, O2, Ar (1/4" Swagelok or 1/4" VCR)

1 chamber

Special dome-shaped chamber made of aluminum

MFC5 systems (H2, CH4, N2, O2, Ar), up to 7 systems

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About Company Handling This Product

Response Rate

100.0%


Response Time

1.7hrs

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