All Categories

History

RF plasma experimental equipment RFPC-550-RFPC-550
RF plasma experimental equipment RFPC-550-Arios Co., Ltd.

RF plasma experimental equipment RFPC-550
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response


About This Product

■Summary

This equipment is an experimental RF plasma equipment that consists of an RF plasma source, substrate heating mechanism, gas supply system, and load lock chamber, and is capable of converting various raw material gases into plasma and processing substrates. By changing conditions such as gas type and gas pressure, a wide range of plasma processing experiments are possible. Flexible design is only possible because we design our plasma sources in-house. We design and manufacture according to the customer's required specifications.

■Features

- Easy operation with automatic matching. - Compact chamber + simple configuration allows for easy maintenance. -Equipped with an interlock to prevent high voltage electric shock from RF (RF can only be applied when in vacuum). -Equipped with high frequency leakage measures and a mechanism to safely stop in the event of a power outage. ・Load lock mechanism can be added as an option. Introducing the board can be done extremely easily and in a short time without exposing it to the atmosphere.

■Options

・Substrate heating mechanism: Maximum heating temperature 900℃, substrate position variable up and down, power supply DC power supply + temperature controller ・Load lock room: TMP+RP ・Processing room: RP + foreline trap (oil mist trap)

  • Product

    RF plasma experimental equipment RFPC-550

Share this product


90+ people viewing


Free
Get started with our free quotation service - no cost, no obligation.

No Phone Required
We respect your privacy. You can receive quotes without sharing your phone number.

1 Models of RF plasma experimental equipment RFPC-550

Image Part Number Price (excluding tax) Power supply section Vacuum gauge Vacuum exhaust system Utility Main body stand Counter electrode Board holder Processing room Load lock chamber Plasma source Gas supply system RF output power
RF plasma experimental equipment RFPC-550-Part Number-RFPC-550

RFPC-550

Available upon quote

Breaker box 1 set, RP switch panel 1 set, vacuum gauge controller 1 set, RF power supply

Thermocouple vacuum gauge (or diaphragm gauge)

Main pump RP + oil mist trap

AC200V 3-phase 20A (maximum)
Process gas: Inert gas SwagelokTM 1/4 or VCRTM 1/4 2 lines

With casters and adjusters (including power supply), weight approximately 300kg

Material: Aluminum, 240mm x 300mm (MAX), vertical drive O-ring type manual

Material: Aluminum, 240mm x 300mm (MAX), RF application electrode

Made of SUS 304

SUS 304 hatch port + O-ring type transfer rod

RF: 0~500W variable + automatic matching box (manual tuning possible)
(Inductive coupling or capacitive coupling, reaction tube: φ40×36 quartz tube)

2 needle valves (or mass flow controller)

0~550W (13.56MHz±1kHz)

Customers who viewed this product also viewed

Reviews shown here are reviews of companies.

See More Plasma Cleaning Systems Products

Other products of Arios Co., Ltd.

Reviews shown here are reviews of companies.


View more products of Arios Co., Ltd.

About Company Handling This Product

Response Rate

100.0%


Response Time

1.7hrs

  • Japan

This is the version of our website addressed to speakers of English in the United States. If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.

Copyright © 2025 Metoree