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  4. Microwave plasma experimental equipment MiPC-1000 (Arios Co., Ltd.)
Microwave plasma experimental equipment MiPC-1000-MiPC-1000
Microwave plasma experimental equipment MiPC-1000-Arios Co., Ltd.

Microwave plasma experimental equipment MiPC-1000
Arios Co., Ltd.

Arios Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

1.7hours

Very Fast Response

About This Product

■Summary

At Arios, we manufacture plasma experimental equipment using microwaves. Because we design everything in-house, including the plasma source and microwave power supply, we can design and manufacture products according to the customer's requested specifications using flexible design that is possible only because we design everything in-house. We can manufacture a wide variety of microwave experimental equipment that can perform DLC films, carbon nanotubes, plasma sterilization, vacuum ultraviolet irradiation, and other plasma exposure experiments. Plasma is explained in detail in Practical Plasma Techniques and Plasma Q&A. Please take a look at them as well.

■Features

- The substrate moving mechanism allows you to arbitrarily set the position of the substrate and plasma, making it compatible with a variety of processes. ・If the substrate is inserted into the plasma, it will be heated by the plasma, so a heater is not required when producing a diamond thin film. - If you want to avoid temperature rise, you can move the substrate away and use the remote plasma method. ・The exhaust system is a turbo molecular pump specification as standard, and a rotary pump specification is also available as an option.

■Options

・Antenna type microwave plasma source ・Changing the stroke of the board vertical mechanism ・Rotary pump only ・Substrate bias power supply ・Changing board size ・Load lock mechanism *In addition to standard specifications, we also design and manufacture products according to requested specifications.

  • Product

    Microwave plasma experimental equipment MiPC-1000

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1 Models of Microwave plasma experimental equipment MiPC-1000

Image Part Number Price (excluding tax) Sample exchange Vacuum gauge Utility Main body stand Substrate heating mechanism Board up/down mechanism Substrate Ultimate vacuum/Ultimate pressure Leak amount Microwave output power Plasma source Gas type
Microwave plasma experimental equipment MiPC-1000-Part Number-MiPC-1000

MiPC-1000

Available upon quote

Replacement hatch

Cold cathode Pirani gauge, capacitance gauge

AC100V 20A, AC200V 3 phase 20A
Process gas: SwagelokTM 1/4 or VCRTM 1/4

With casters and adjusters (including power supply)
Weight approximately 150kg

Maximum heating temperature 1,000℃

Stroke 235mm

Compatible with φ20mm board

5.0×10^-4 Pa or less (when using turbo molecular pump)

1.0×10^-8 Pa・m^3/sec or less (excluding O-ring transmission)

0~1,000W (2.45GHz ± 50MHz)

Quartz waveguide orthogonal method

H2, Ne, N2, Ar, O2, CH4, etc...

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About Company Handling This Product

Arios Co., Ltd.

Response Rate

100.0%

Response Time

1.7hrs

  • Japan

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