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  2. FIB post -processing nanomil device MODEL 1040 nanomill (Musashino Denshi, INC.)
FIB post -processing nanomil device MODEL 1040 nanomill-Model 1040
FIB post -processing nanomil device MODEL 1040 nanomill-Musashino Denshi, INC.

FIB post -processing nanomil device MODEL 1040 nanomill
Musashino Denshi, INC.

About This Product

Using ultra -low -energy concentrated ion beams, the highest quality sample is ideal for observing transparent electron microscope (TEM). This is a post -processing milling device for TEM samples made by FIB (rising ion beam).

■ Features

・ Ultra -low energy inert gas ion source ・ Concentrated ion beam with a scanning ability ・ Remove the damage layer without restoring ・ Ideal for processing after processing ion beam (FIB) ・ Improved results obtained from the samples created by the conventional method ・ Nanoming at extremely low temperature from room temperature ・ High -speed sample exchange suitable for high processing capacity applications ・ A device with excellent operability, being controlled by computer and allows you to program all ・ Dry -dry vacuum system without pollution E.A. Fiscency Instruments, Inc. device, which builds a sample using conventional technologies such as dimming polishing, ultrasonic disccuts, and producing a sample without damage from the concentrated ion beam. 。 Also, by removing only organic substances from the sample and holder from the sample and holder, the optimal environment for TEM and SEM electron microscope observation is realized by removing only organic substances.

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    FIB post -processing nanomil device MODEL 1040 nanomill

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1 Models of FIB post -processing nanomil device MODEL 1040 nanomill

Image Part Number Price (excluding tax) Body dimensions Body weight Ion source Variable energy Ion supply current Beam current Sample stage rotation Set angle rotation Milling angle Control method Vacuum pump Process gas power supply
FIB post -processing nanomil device MODEL 1040 nanomill-Part Number-Model 1040

Model 1040

Available upon quote

W673mm x D775mm x H1613mm

194kg

Holder anodial discharge (HAD)

0.5 ~ 6.0kv

3 to 8 MA

Max.400 Microan Pair

1 to 360 ° (can be set in one time)

0 ± 179 °

0 ~ 45 °

PC control

Turbo molecular pump (70 liters)
Use diaphragm type rafing pump with defrosting device

Flow speed about 0.4 ~ 1.0scm/ion source
10PSI feed pressure

AC100V, single -phase, 50/60Hz, 7A

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About Company Handling This Product

Musashino Denshi, INC.

Company Overview

Musashino Denshi, INC., established in 1977 and based in Japan, is a manufacturer of grinding and polishing ma...

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