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  4. Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches (Musashino Denshi, INC.)
Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-20
Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-Musashino Denshi, INC.

Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches
Musashino Denshi, INC.

Musashino Denshi, INC.'s Response Status

Response Rate

100.0%

Response Time

4.6hours

Company Review

5.0

Very Fast Response

About This Product

When performing polishing, it is important to select an abrasive that is suitable for samples. When handling a sample that responds to water, it is used by mixing oily abrasives and polished abrasive grains and lubricating oil. When the polishing surface is made a mirror finish, polish it using a CMP abrasive. In this way, we propose the best abrasive for the sample ingredients and the finishing goals of the polishing surface.

■ It is possible to remove the distortion of samples, deteriorate layers, and fine scratches

Ideal for polishing compound, sapphire, glass, etc.

■ Features

・ CMP abrasive using high concentration Coloidal silica. ・ It is excellent in the uniformity and dispersion of the abrasive grain. ・ Ideal for CMP polishing such as compounds and sapphires.

■ Use

・ Gallium oxide (GA2O3) ・ Calcium fluff (CAF2) ・ Germanium Acids (Bi4ge3O12) ・ Lithium tantalate (Lita3) ・ Lithium niovate (Linbo3) ·sapphire ・ Glass ・ Ceramics ... etc.

  • Product

    Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches

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5 Models of Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches

Click on the part number for more information about each product

Image Part Number Price (excluding tax) capacity Particle size (μm) pH value
Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-Part Number-20

20

Available upon quote

20kg, 2kg

0.02

9.2

Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-Part Number-50

50

Available upon quote

20kg, 2kg

0.04

10.2

Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-Part Number-80

80

Available upon quote

20kg, 2kg

0.07

10.2

Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-Part Number-120

120

Available upon quote

20kg, 2kg

0.08

9.2

Colloidal silica abrasive to remove sample distortion, deterioration layer, and fine scratch scratches-Part Number-Exiii

Exiii

Available upon quote

20kg, 2kg

0.03

9.5

Click on the part number for more information about each product

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About Company Handling This Product

Musashino Denshi, INC.

Response Rate

100.0%

Response Time

4.6hrs

Company Review

5.0

Company Overview

Musashino Denshi, INC., established in 1977 and based in Japan, is a manufacturer of grinding and polishing ma...

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  • Japan

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