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  4. Semiconductor manufacturing equipment PEGASUS HDP-CVD (Cellback Co., Ltd.)
Semiconductor manufacturing equipment PEGASUS HDP-CVD-PEGASUS HDP-CVD
Semiconductor manufacturing equipment PEGASUS HDP-CVD-Cellback Co., Ltd.

Semiconductor manufacturing equipment PEGASUS HDP-CVD
Cellback Co., Ltd.

About This Product

PEGASUS HDP-CVD uses the high gas decomposition efficiency of ICP's high-density plasma to form low-temperature films and create dense films. There are two types of HDP-CVD, type B and type H, which are used for low-temperature film formation and high-speed processing. Low-temperature SiO2 films can also be formed with a withstand voltage (10MV) on the same level as thermal oxide films.

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    Semiconductor manufacturing equipment PEGASUS HDP-CVD

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1 Models of Semiconductor manufacturing equipment PEGASUS HDP-CVD

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Semiconductor manufacturing equipment PEGASUS HDP-CVD-Part Number-PEGASUS HDP-CVD

PEGASUS HDP-CVD

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About Company Handling This Product

Cellback Co., Ltd.

  • Japan

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Semiconductor Manufacturing Equipment Component & Part Machining
Semiconductor Manufacturing Equipment Component & Part Machining　Cellback Co., Ltd.
Cellback Co., Ltd.

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