Wafer surface equipment WM-10 is suitable for 90-65nm process node, low price and high performance
■Features/Applications
・Achieves maximum detection sensitivity of 48nm by adopting high-output Violet-LD. Ideal for mass production and prototyping of 90-65nm process nodes.
・Space saving: Smallest class among 300mm compatible machines
・Significant reduction in running costs, 2/1 that of Ar ion lasers (compared to our company)
・Uses a 2-axis optical system that can be used in all fields from materials to device manufacturers
・Achieved 1.5 times higher throughput than previous models (compared to our company)
・Environmentally friendly and power saving, 30% less than previous models (compared to our company)
・Various options such as automatic sensitivity correction function are also available.
This is the version of our website addressed to speakers of English in
the United States.
If you are a resident of another country, please select the appropriate version of Metoree for your country in the drop-down menu.