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  4. Wafer surface inspection equipment WM-10 (Irie Co., Ltd.)
Wafer surface inspection equipment WM-10-WM-10
Wafer surface inspection equipment WM-10-Irie Co., Ltd.

Wafer surface inspection equipment WM-10
Irie Co., Ltd.

Irie Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

14.5hours

Company Review

4.8

Relatively Fast Response

About This Product

Wafer surface equipment WM-10 is suitable for 90-65nm process node, low price and high performance

■Features/Applications

・Achieves maximum detection sensitivity of 48nm by adopting high-output Violet-LD. Ideal for mass production and prototyping of 90-65nm process nodes. ・Space saving: Smallest class among 300mm compatible machines ・Significant reduction in running costs, 2/1 that of Ar ion lasers (compared to our company) ・Uses a 2-axis optical system that can be used in all fields from materials to device manufacturers ・Achieved 1.5 times higher throughput than previous models (compared to our company) ・Environmentally friendly and power saving, 30% less than previous models (compared to our company) ・Various options such as automatic sensitivity correction function are also available.

  • Product

    Wafer surface inspection equipment WM-10

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1 Models of Wafer surface inspection equipment WM-10

Image Part Number Price (excluding tax) Mass (kg) Measurement target Detection/scanning method Scattered light detection/helical scanning method Size (mm) Reproducibility Light source Wafer size
Wafer surface inspection equipment WM-10-Part Number-WM-10

WM-10

Available upon quote

950

Bare wafer/wafer with membrane

Scattered light detection/helical scanning method

Bare 48nm/Film 60nm

1,272 (W) ×1,213 (D) ×1,650 (H)

Σ/X ≦1% (99% or more)

Violet LD

300/200, 200/150mm (100mm is optional)

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About Company Handling This Product

Irie Co., Ltd.

Response Rate

100.0%

Response Time

14.5hrs

Company Review

4.8
  • Japan

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Semiconductor inspection equipment
Semiconductor inspection equipment　Irie Co., Ltd.
Irie Co., Ltd.

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