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  4. Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S (Irie Co., Ltd.)
Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S-WM-7S
Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S-Irie Co., Ltd.

Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S
Irie Co., Ltd.

Irie Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

14.5hours

Company Review

4.8

Relatively Fast Response

About This Product

It is capable of detecting particles on the wafer surface with high sensitivity, and is essential for maintaining yields in semiconductor manufacturing.

■Features

・High sensitivity measurement ⇒ Increased sensitivity by using short wavelength laser ・High dynamic range (Bare-Si) ⇒0.079㎛~5.0㎛ ・High sensitivity stability ⇒ Reproducibility of repeated measurements 1% or less (standard deviation σ/average value of total number of particles X) ・High cost performance ・Low running cost ⇒Long life and low power consumption design by using Violet LD

■Applications

・Device mass production process: Process and process control Particle inspection and control before and after equipment maintenance Analysis and analysis using particle coordinates ・New line construction/equipment introduction Particle inspection/management after installation ・Wafer/reclaimed wafer manufacturer process/process management ・Research institutes/universities process development ・Resist/chemical/abrasive particle inspection/evaluation ・Equipment/equipment manufacturer: Particle evaluation before development, manufacturing, and shipping, etc.

■SMIF system can be installed (wafer size 200mm)

Achieve a local clean environment by combining SMIF and HEPA filters

■Various software

・XY coordinate output ⇒ Used for foreign matter analysis with SEM/AFM ・Map overlay software ⇒ Visualizes the increase and decrease of particles with respect to the reference wafer ・Checking the cleaning process ability ・Checking the increase in particles due to process equipment ・Haze measurement function ⇒ You can check the surface condition (roughness) of wafers with film

■Automatic sensitivity correction

・Automate sensitivity correction work - Sensitivity check is possible with simple operations ・Accurate sensitivity correction is possible using a calibration wafer coated with PSL particles

  • Product

    Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S

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1 Models of Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S

Image Part Number Price (excluding tax) Scanning method Device power supply Maximum detection sensitivity Compatible wafer size Size (mm) Pressure air Ultimate vacuum Light source
Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S-Part Number-WM-7S

WM-7S

Available upon quote

Spiral scan

Single phase AC200V, 20A

Bare-Si wafer: 0.079㎛

50mm~200mm

860 (W) ×900 (D) ×1,650 (H)

490kPa~980kPa (500kPa guideline) 2ℓ/min Diameter 1/4 in

-101kPa~-73kPa (-80kPa guideline) 20~50ℓ/min (equivalent to vacuum pump capacity) Diameter 1/4 in

Violet LD (about 405nm)

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About Company Handling This Product

Irie Co., Ltd.

Response Rate

100.0%

Response Time

14.5hrs

Company Review

4.8
  • Japan

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Semiconductor inspection equipment
Semiconductor inspection equipment　Irie Co., Ltd.
Irie Co., Ltd.

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