Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S-WM-7S
Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S-Irie Co., Ltd.

Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S
Irie Co., Ltd.


About This Product

It is capable of detecting particles on the wafer surface with high sensitivity, and is essential for maintaining yields in semiconductor manufacturing. ■Features ・High sensitivity measurement ⇒ Increased sensitivity by using short wavelength laser ・High dynamic range (Bare-Si) ⇒0.079㎛~5.0㎛ ・High sensitivity stability ⇒ Reproducibility of repeated measurements 1% or less (standard deviation σ/average value of total number of particles X) ・High cost performance ・Low running cost ⇒Long life and low power consumption design by using Violet LD ■Applications ・Device mass production process: Process and process control Particle inspection and control before and after equipment maintenance Analysis and analysis using particle coordinates ・New line construction/equipment introduction Particle inspection/management after installation ・Wafer/reclaimed wafer manufacturer process/process management ・Research institutes/universities process development ・Resist/chemical/abrasive particle inspection/evaluation ・Equipment/equipment manufacturer: Particle evaluation before development, manufacturing, and shipping, etc. ■SMIF system can be installed (wafer size 200mm) Achieve a local clean environment by combining SMIF and HEPA filters ■Various software ・XY coordinate output ⇒ Used for foreign matter analysis with SEM/AFM ・Map overlay software ⇒ Visualizes the increase and decrease of particles with respect to the reference wafer ・Checking the cleaning process ability ・Checking the increase in particles due to process equipment ・Haze measurement function ⇒ You can check the surface condition (roughness) of wafers with film ■Automatic sensitivity correction ・Automate sensitivity correction work - Sensitivity check is possible with simple operations ・Accurate sensitivity correction is possible using a calibration wafer coated with PSL particles

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    Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S

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1 Models of Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S

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Highly sensitive measurement of particles on non-patterned wafers Wafer surface inspection system WM-7S-Part Number-WM-7S

WM-7S

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