All Categories
History
This section provides an overview for semiconductor cleaning equipment as well as their applications and principles. Also, please take a look at the list of 10 semiconductor cleaning equipment manufacturers and their company rankings. Here are the top-ranked semiconductor cleaning equipment companies as of December, 2024: 1.Modutek Corporation, 2.Ransohoff, 3.ACM Research, Inc..
Table of Contents
Categories Related to Semiconductor Cleaning Equipment
Semiconductor cleaning equipment includes the tools and systems employed in the cleaning stage of semiconductor manufacturing, a critical phase that accounts for a significant portion of the production process.
This equipment is designed to remove contaminants before critical processes like high-temperature treatments and thin-film depositions, as well as to clear away residues like resist after etching processes. It is categorized into wet and dry types, based on the cleaning medium used.
Utilized across various manufacturing stages, semiconductor cleaning equipment is especially crucial in the initial stages of device formation on silicon wafers and the final stages involving device separation and packaging. Its role is pivotal in ensuring contaminant-free surfaces, thereby enhancing the quality and yield of semiconductor devices.
These systems are integral to maintaining wafer cleanliness through various manufacturing steps, including before and after oxidation, chemical vapor deposition (CVD), and sputtering processes. Adequate cleaning is essential to minimize defects and ensure high-quality production.
Wet cleaning equipment typically engages a sequence of chemical baths followed by rinsing and drying steps, whereas dry cleaning methods might employ gases or plasma to achieve the desired cleanliness without liquid chemicals.
Cleaning equipment varies by operational method and cleaning medium:
Batch Type: Processes multiple wafers simultaneously, with variations such as multi-vessel and single-vessel types depending on the chemical treatment sequence.
Single Wafer Type: Cleans wafers individually, often using nozzles to apply cleaning solutions while rotating the wafer for thorough coverage.
Wet Type: Employs liquid chemicals for cleaning operations.
Dry Type: Uses gases or aerosols, avoiding liquid mediums.
Diverse structures cater to different cleaning methodologies:
This configuration allows for sequential immersion and processing of wafers, suited for high-volume operations but requiring significant space and chemical usage.
A more space-efficient approach using a single tank where chemicals are changed between processes, though it still necessitates considerable chemical consumption.
Targets individual wafers with chemical sprays, minimizing solution use and contamination risk, though chemical recovery can be challenging due to dispersion.
Selection depends on the specific contaminants targeted for removal, with techniques varying for particles, organic residues, and metal impurities, such as microscopic dust, sodium molecules, oil and grease components contained in human sweat, and organic matter such as carbon molecules and metal atoms contained in chemicals used in the factory. Each contaminant type may require different cleaning strategies, from physical brushing and alkaline washes for particles to acidic and ozone treatments for organic and metal contaminants, respectively.
*Including some distributors, etc.
Sort by Features
Sort by Area
Ransohoff was founded in 1916 and is located in Cincinnati, Ohio. Today, the company is a division of Cleaning Technologies Group. Cleaning Technologies Group is a provider of innovative process technologies to precision and industrial global manufacturing markets. Ransohoff is a manufacturer of aqueous and solvent-based parts cleaning systems as well as a complete line of recyclable aqueous chemistries and waste minimization technologies. The company serves market sectors including electrical components, optics, general manufacturing, heavy-duty trucks, and off-road vehicles. The company offers industrial parts washers, ultrasonic and megasonic cleaning systems, benchtop cleaning systems, and electronic cleaning systems.
C&D Semiconductor Services Inc. is a manufacturer of semiconductor equipment founded in 1989 and headquartered in San Jose, California. The company specializes in wafer handling, processing, and inspection requirements in semiconductor manufacturing. It offers wafer-on-tape frames, wafer alloy annealing, wafer sorters, and wafer cleaners. It also provides photoresist coating, metal lift-off systems, microscope loaders, and optical edge bead exposure systems. The company’s products and technologies find applications in photoresist development, spray coating, thin film development, and bioscience.
Modutek Corporation, established in 1980 and headquartered in San Jose, California, is a manufacturer specializing in semiconductor wet process equipment and wet bench stations. The company offers an extensive and diverse product portfolio that includes vacuum metal etcher wet process equipment, rotary wafer etching systems, quartz tube cleaning stations, stainless steel solvent stations, and nitride etch baths wet process equipment. These advanced equipment solutions are integral to various semiconductor applications, including silicon wafer cleaning, wafer processing time improvement, and silicon nitride strip processes for the removal of silicon nitride using a hot acid bath.
Samco Inc, founded in 1979 and headquartered in Kyoto, Japan, is a manufacturer and supplier specializing in semiconductor and electronic component manufacturing systems. The company's product portfolio includes low-stress chemical vapor deposition systems, atomic layer deposition systems, reactive ion etching systems, plasma cleaners, and Aqua Plasma Cleaners. These products are applied in various industries, including semiconductor manufacturing, the electronics industry, optoelectronics, photonics, and biotechnology. The company has office locations overseas, including China, the USA, Singapore, Malaysia, and Liechtenstein.
TAZMO CO., LTD., founded in 1972 and based in Okayama, Japan, is a manufacturer and distributor of advanced manufacturing equipment and systems. Its products cover a diverse spectrum, including semiconductor manufacturing tools, nanoimprint solutions, FPD manufacturing equipment, clean transfer systems, and precision molding dies. These offerings cater to various industries, enhancing semiconductor manufacturing efficiency. The company's products meets rigorous industry standards and regulations, underscoring its adherence to quality and precision.
Shibaura Mechatronics Corporation, established in 1939 and headquartered in Yokohama, Japan, is a manufacturer and supplier of various production equipment. Its product line encompasses FPD manufacturing equipments that include array process, cell process, and module process equipment. ALso offered are semiconductor manufacturing equipment, vacuum equipment, and other equipment used in applications related to manufacturing equipment. The company also develops and manufactures vending machines compatible with numerous electronic payment systems, including credit cards and electronic money.
SCREEN Holdings Co., Ltd., founded in 1943 and based in Kyoto, Japan, is a manufacturer and seller of semiconductors, graphic arts, display production, deposition and much more. The company provides a wide range of products including semiconductor production equipment for smartphones, consumer electronics, and much more, displays for digital devices, PCB-related equipment for mobile phones & vehicle systems, and more. The company serves various industries such as pharmaceuticals, energy, and IT among others. It holds the ISO 9001, ISO 13485, ISO 2231, and ISO 1400 certifications among others.
The Max Planck Institute for Marine Microbiology was founded in 1992 and is a researcher and supplier of products and services to the scientific community, headquartered in Bremen, Germany. The institute specializes in research related to the diversity and function of marine microorganisms, interactions in the marine environment, and the impact of climate change. It provides access to research laboratories, specialized equipment, and educational and training programs. MPIMM is a part of the Max Planck Society and caters to the general public, academic research, biotechnology, pharmaceutical, and energy industries.
Ranking as of December 2024
Derivation Method| Rank | Company | Click Share |
|---|---|---|
| 1 | Modutek Corporation |
23.9%
|
| 2 | Ransohoff |
16.0%
|
| 3 | ACM Research, Inc. |
15.4%
|
| 4 | C&D Semiconductor Services Inc |
12.0%
|
| 5 | AXUS TECHNOLOGY |
7.0%
|
| 6 | TAZMO CO.,LTD. |
6.2%
|
| 7 | The Max Planck Institute for Marine Microbiology |
6.0%
|
| 8 | Samco Inc |
5.3%
|
| 9 | SHIBAURA MECHATRONICS CORPORATION |
4.7%
|
| 10 | SCREEN Holdings Co., Ltd. |
3.4%
|
Derivation Method
The ranking is calculated based on the click share within the semiconductor cleaning equipment page as of December 2024. Click share is defined as the total number of clicks for all companies during the period divided by the number of clicks for each company.Number of Employees
Newly Established Company
Company with a History
*Including some distributors, etc.
*Including some distributors, etc.
| Country | Number of Companies | Share (%) |
|---|---|---|
|
United States of America
|
4 | 44.4% |
|
Japan
|
4 | 44.4% |
|
Germany
|
1 | 11.1% |
33 products found - Page 1
33 products - Page 1
TAZMO CO.,LTD.
100+ people viewing
Last viewed: 27 minutes ago
This is a device that peels off device supports laminated with thermosetting/plastic materials. After mechanical peeling, cleaning of the residue i...
JAPAN BLUE Co., Ltd.
40+ people viewing
Last viewed: 1 day ago
■For those who are considering introducing new semiconductor cleaning equipment Our company handles everything from specification determination and...
TAZMO CO.,LTD.
140+ people viewing
Last viewed: 22 hours ago
We support ultra-thin wafers for the purpose of advanced 3D packaging and countermeasures against vulnerabilities caused by device thinning, and fu...
Cosmo Giken Co., Ltd.
20+ people viewing
Last viewed: 5 hours ago
Compact design desktop type UV (ultraviolet rays) ozone cleaning reformer "CUVD series" for removing organic contaminants from silicone wafers, sem...
PHT Co., Ltd.
1350+ people viewing
Last viewed: 3 hours ago
PHT will be active in the semiconductor industry as a niche top company in automatic wafer stripping equipment (peeling and cleaning machines) arou...
OHMIYA IND.CO.,LTD
70+ people viewing
Last viewed: 5 hours ago
The carrier cleaning machine is a cleaning and drying device for wafer carriers and carrier boxes. Cleaning with a high-pressure water shower and d...
TAZMO CO.,LTD.
90+ people viewing
Last viewed: 9 hours ago
The hot phosphoric acid used for nitride film etching increases the concentration of silicon produced during the process, so it must be replaced re...
TAZMO CO.,LTD.
70+ people viewing
Last viewed: 10 hours ago
In the hot phosphoric acid process, the silicon concentration is too low immediately after the chemical solution in the treatment tank is replaced,...
M.WATANABE & CO.,LTD.
50+ people viewing
Last viewed: 11 hours ago
Displaces moisture with IPA steam and dries the target object. For 4 to 8 inch wafers. Can be installed and docked in various cleaning machines. T...
Denshi Giken Co., Ltd.
30+ people viewing
Last viewed: 5 hours ago
■Summary The board is transported horizontally and subjected to UV cleaning, brush cleaning, shower spray cleaning, ultrasonic cleaning, and drying...
Denshi Giken Co., Ltd.
30+ people viewing
Last viewed: 5 hours ago
■Summary Etching/shower cleaning/drying is performed on substrates such as LCDs by horizontal transportation. ■Features ・Uniform process using di...
Bruker Corporation
290+ people viewing
Last viewed: 3 hours ago
Standard Response
■CO₂ precision dry cleaning equipment for masks ・Removal of repair residue for photomasks and particles by dry cleaning ・Control particle re-adhe...
Bruker Corporation
230+ people viewing
Last viewed: 1 hour ago
Standard Response
■CO2 dry cleaning equipment for wafers ・Particle removal by CO2 precision dry cleaning for wafers ・By adopting an optimized unique nozzle, it is ...
Hugle Electronics Co., Ltd.
20+ people viewing
Last viewed: 1 day ago
We live in an era where the concept of maintaining and improving high productivity in semiconductor manufacturing by cleaning FOUPs and FOSBs is es...
Hugle Electronics Co., Ltd.
10+ people viewing
As an automatic cleaning device for FOUPs for 300mm wafers, this is a model change of the UPC-12100, which has earned the world's top-class perform...
Hugle Electronics Co., Ltd.
20+ people viewing
This is a front touch panel type manual cleaning machine developed for precision cleaning and drying of 8-inch SMIFPOD. The IA-8 is a cleaning and ...
Hugle Electronics Co., Ltd.
20+ people viewing
Last viewed: 1 hour ago
This device was developed as a successor to the CRD-4500, and is an automatic cleaning system that can handle up to 8" wafer carriers and boxes. Th...
Hugle Electronics Co., Ltd.
10+ people viewing
Last viewed: 5 hours ago
This is a front-operated manual set type developed for precision cleaning and drying of 8-inch SMIFPODs. The IA-8 is a cleaning and drying device t...
Hugle Electronics Co., Ltd.
20+ people viewing
Last viewed: 19 hours ago
This is a fully automatic cleaning system for RSP200 and RSP150, which are specialized containers for reticles. This device is equipped with high c...
Hugle Electronics Co., Ltd.
20+ people viewing
Last viewed: 19 hours ago
This is a fully automatic cleaning device (patented) for EUVPOD used in EUV exposure, the latest exposure technology. In addition to disassembly/re...
Denshi Giken Co., Ltd.
20+ people viewing
Last viewed: 1 day ago
■Summary After cleaning/rinsing the substrate with spin rotation and spray, dry it with high speed spin rotation. ■Features ・Excellent particle r...
HiSOL,Inc.
140+ people viewing
Last viewed: 1 hour ago
This is a tabletop cleaning device that is ideal for research and development. It can be used as an alternative to hand washing, such as when clean...
HiSOL,Inc.
120+ people viewing
Last viewed: 1 hour ago
■ Ultrasonic lift-off/organic stripping equipment ideal for strong resist removal and burr removal Achieves high quality substrates and reduces ru...
HiSOL,Inc.
70+ people viewing
Last viewed: 5 hours ago
■ If you are particular about semiconductor quality, you must also be particular about cleaning. Achieves a full process from chemical treatment to...
Denshi Giken Co., Ltd.
30+ people viewing
Last viewed: 3 hours ago
■Summary The substrate is subjected to phenomenon/etching/drying treatment using a spray method. ■Features ・Highly accurate and uniform process u...
Adtech Engineering Co., Ltd.
20+ people viewing
■Product overview A simple dry cleaning machine with just a cyclone brush and dust suction. ■Equivalent ability to 5 adhesive rollers Not only doe...
Kyodo International, Inc.
30+ people viewing
Last viewed: 7 hours ago
This system uses pure water spray to wash away slurry that has spattered onto equipment parts. It can improve the wafer micro-scratch problem cause...
Kitagawa Grestech Co., Ltd.
30+ people viewing
Last viewed: 23 hours ago
■Product information We provide CMP equipment for testing and mass production according to wafer size. We also accept custom-made products accordin...
Kitagawa Grestech Co., Ltd.
40+ people viewing
Last viewed: 10 hours ago
■Product information We provide CMP equipment for testing and mass production according to wafer size. We also accept custom-made products accordin...
