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HiSOL,Inc.'s Semiconductor Cleaning Equipment

HiSOL,Inc.

3 products found

HiSOL,Inc.

Lapping/polishing equipment Wafer cleaning equipment ParticleClean

260+ people viewing

Last viewed: 15 hours ago

Standard Response

Response Rate
100.0 %
Response Time
28.6 hours

This is a tabletop cleaning device that is ideal for research and development. It can be used as an alternative to hand washing, such as when clean...

HiSOL,Inc.

Spin type single wafer processing equipment

150+ people viewing

Standard Response

Response Rate
100.0 %
Response Time
28.6 hours

■ If you are particular about semiconductor quality, you must also be particular about cleaning. Achieves a full process from chemical treatment to...

HiSOL,Inc.

Single wafer cleaning equipment Spin/Dip® single wafer processing equipment

240+ people viewing

Last viewed: 11 hours ago

Standard Response

Response Rate
100.0 %
Response Time
28.6 hours

■ Ultrasonic lift-off/organic stripping equipment ideal for strong resist removal and burr removal Achieves high quality substrates and reduces ru...


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