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Bruker Corporation's Semiconductor Cleaning Equipment

Bruker Corporation

2 products found

Bruker Corporation

Photomask CO₂ dry cleaning equipment RAVE EL-C

440+ people viewing

Standard Response

Response Rate
100.0 %
Response Time
24.5 hours

■CO₂ precision dry cleaning equipment for masks ・Removal of repair residue for photomasks and particles by dry cleaning ・Control particle re-adhe...

Bruker Corporation

Wafer dry cleaning equipment WaferClean 2200

350+ people viewing

Last viewed: 1 day ago

Standard Response

Response Rate
100.0 %
Response Time
24.5 hours

■CO2 dry cleaning equipment for wafers ・Particle removal by CO2 precision dry cleaning for wafers ・By adopting an optimized unique nozzle, it is ...


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