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7 products found
TAZMO CO.,LTD.
430+ people viewing
Last viewed: 49 minutes ago
Single wafer cleaning system CENOTE ® is a multi-functional single wafer cleaning device that uses a multi-cup method. By continuously supplying cl...
TAZMO CO.,LTD.
400+ people viewing
Last viewed: 18 hours ago
The hot phosphoric acid used for nitride film etching increases the concentration of silicon produced during the process, so it must be replaced re...
TAZMO CO.,LTD.
280+ people viewing
Last viewed: 1 day ago
In the hot phosphoric acid process, the silicon concentration is too low immediately after the chemical solution in the treatment tank is replaced,...
TAZMO CO.,LTD.
460+ people viewing
Last viewed: 49 minutes ago
The batch cleaning equipment TIGRIS®200 and TIGRIS®300 are high-performance immersion cleaning and etching systems compatible with 200mm/300mm, wit...
TAZMO CO.,LTD.
490+ people viewing
Last viewed: 4 hours ago
This is a device that peels off device supports laminated with thermosetting/plastic materials. After mechanical peeling, cleaning of the residue i...
TAZMO CO.,LTD.
520+ people viewing
Last viewed: 1 day ago
We support ultra-thin wafers for the purpose of advanced 3D packaging and countermeasures against vulnerabilities caused by device thinning, and fu...
TAZMO CO.,LTD.
350+ people viewing
Last viewed: 22 hours ago
It has a unique equipment configuration that combines a batch immersion type cleaning module and a single wafer type cleaning module, making it sui...