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6 products found
TAZMO CO.,LTD.
230+ people viewing
Last viewed: 8 hours ago
Single wafer cleaning system CENOTE ® is a multi-functional single wafer cleaning device that uses a multi-cup method. By continuously supplying cl...
TAZMO CO.,LTD.
200+ people viewing
NISON®1800 has been widely used in the semiconductor industry for many years as an indispensable device for etching nitride films using hot phospho...
TAZMO CO.,LTD.
250+ people viewing
Last viewed: 1 day ago
The hot phosphoric acid used for nitride film etching increases the concentration of silicon produced during the process, so it must be replaced re...
TAZMO CO.,LTD.
180+ people viewing
In the hot phosphoric acid process, the silicon concentration is too low immediately after the chemical solution in the treatment tank is replaced,...
TAZMO CO.,LTD.
250+ people viewing
The batch cleaning equipment TIGRIS®200 and TIGRIS®300 are high-performance immersion cleaning and etching systems compatible with 200mm/300mm, wit...
TAZMO CO.,LTD.
200+ people viewing
Last viewed: 4 hours ago
It has a unique equipment configuration that combines a batch immersion type cleaning module and a single wafer type cleaning module, making it sui...