Reactive Process Gas Monitor Qulee RGM2-202/RGM2-302
ULVAC Sales Co., Ltd.
About This Product
■Summary
Reactive process gas monitor Qulee RGM2-202/RGM2-302 is a process monitor with a differential exhaust system that supports reactive processes such as etching and CVD from the Qulee series. ULVAC's unique ion source and exhaust system structure provide excellent corrosion resistance against reactive gases and enable stable measurement over long periods of time.
■Applications
・Monitoring of reactive gas during process in etching/CVD equipment
・Endpoint monitor for etching and cleaning processes
・Residual gas measurement
・Leak test
■Features
・Enables stable measurement over a long period of time during reactive processes
・Using a Claude ion source with a magnetic field: soft ionization reduces gas dissociation and prevents decomposition and adsorption due to thermal reactions in the highly sensitive ionization chamber
・Compact flow control valve: Shortens the distance from the process chamber to the ion source, allowing for fast response decomposition.
・Measurement is possible at a wide range of pressures from 10^-6 to 13kPa (depending on orifice selection)
・Measurement possible without a PC
・One Click function (Easy for anyone, no complicated operations required)
・High temperature baking up to 120°C is possible when the sensor unit is connected.
・Equipped with traceability function for preventive maintenance of ion source and secondary electron multiplier tube (patent pending)
・Helium leak test, air leak test, build-up test possible
・Software included as standard (compatible with Windows 7, 8, 10)
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Product
Reactive Process Gas Monitor Qulee RGM2-202/RGM2-302
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Handling Company
ULVAC Sales Co., Ltd.
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Categories
1 Models of Reactive Process Gas Monitor Qulee RGM2-202/RGM2-302
| Product Image | Part Number | Price (excluding tax) |
|---|---|---|
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RGM2-202 |
Available upon quote |
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About Company Handling This Product
- Japan