Medium current ion implanter for research and development IMX-3500-IMX-3500
Medium current ion implanter for research and development IMX-3500-ULVAC Sales Co., Ltd.

Medium current ion implanter for research and development IMX-3500
ULVAC Sales Co., Ltd.


About This Product

■Summary The medium current ion implanter IMX-3500 is an ion implanter with a maximum energy of 200kV and a wafer size of up to 8 inches, making it ideal for research and development at universities. ■Features - Equipped with a platen that can handle irregularly shaped substrates with a maximum wafer size of 8 inches. - In addition to gas sources, solid evaporation sources can also be used for ion sources that are easy to handle safely for B, P, and As ions. -The HV terminal part has the same configuration as mass-produced equipment, ensuring high reliability.

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    Medium current ion implanter for research and development IMX-3500

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1 Models of Medium current ion implanter for research and development IMX-3500

Product Image Part Number Price (excluding tax) Energy Ionic species Maximum beam current Minimum beam current
Medium current ion implanter for research and development IMX-3500-Part Number-IMX-3500

IMX-3500

Available upon quote 30~200keV (3~200keV available as option) B, P, As, Si, Ge, Sb, In, etc. 11B+400μA (200keV)
31P+600μA (200keV)
150nA

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