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Medium current ion implanter for research and development IMX-3500-IMX-3500
Medium current ion implanter for research and development IMX-3500-ULVAC Sales Co., Ltd.

Medium current ion implanter for research and development IMX-3500
ULVAC Sales Co., Ltd.

ULVAC Sales Co., Ltd.'s Response Status

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100.0%

Response Time

125.8hours


About This Product

■Summary

The medium current ion implanter IMX-3500 is an ion implanter with a maximum energy of 200kV and a wafer size of up to 8 inches, making it ideal for research and development at universities.

■Features

- Equipped with a platen that can handle irregularly shaped substrates with a maximum wafer size of 8 inches. - In addition to gas sources, solid evaporation sources can also be used for ion sources that are easy to handle safely for B, P, and As ions. -The HV terminal part has the same configuration as mass-produced equipment, ensuring high reliability.

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    Medium current ion implanter for research and development IMX-3500

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1 Models of Medium current ion implanter for research and development IMX-3500

Image Part Number Price (excluding tax) Minimum beam current Maximum beam current Energy Ionic species
Medium current ion implanter for research and development IMX-3500-Part Number-IMX-3500

IMX-3500

Available upon quote

150nA

11B+400μA (200keV)
31P+600μA (200keV)

30~200keV (3~200keV available as option)

B, P, As, Si, Ge, Sb, In, etc.

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About Company Handling This Product

Response Rate

100.0%


Response Time

125.8hrs

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