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  4. Nanopattern exposure equipment "PhableR 100 (Kyodo International, Inc.)
Nanopattern exposure equipment "PhableR 100-Nanopattern exposure equipment "PhableR 100
Nanopattern exposure equipment "PhableR 100-Kyodo International, Inc.

Nanopattern exposure equipment "PhableR 100
Kyodo International, Inc.

Kyodo International, Inc.'s Response Status

Response Rate

100.0%

Response Time

70.3hours

About This Product

■PhableR 100 achieves high resolution below 300nm pitch

・PhableR 100 is a system based on EULITHA's proprietary exposure technology PHABLE (abbreviation for Photonics Enabler), which enables non-contact proximity exposure of high-resolution periodic structures. PhablerR 100 provides essentially the same resolution as a DUV projection exposure system without the complex and expensive optics and mechanical structures. ・While general mask aligners have a resolution of only 1-2um, it is possible to create linear gratings with a half pitch of 150nm with high uniformity. - Linear or curved gratings and hexagonal/square symmetric 2D photonic crystal patterns can be transferred with a period of 300 nm or less. ・Full exposure ・The mask and substrate are manually set into the device, and the exposure process is controlled by the on-board computer.

■Non-contact: Protects the mask from damage and contamination

It can also be used as a regular mask aligner in proximity or contact mode, and even micron-scale structures can be transferred.

■Virtually unlimited depth focus

The virtually unlimited depth focus of the PhableR 100 allows high-resolution patterns to be transferred with high uniformity even onto non-flat substrates used in photonic applications.

■General photoresists and materials can be used

・PhableR 100 is compatible with substrates up to φ100mm and industry standard chrome masks and phase shift masks. ・Standard i-line photoresists (positive/negative) are available. ・Suitable for non-flat substrates (e.g. epi wafer) ・High uniformity ・Overlay alignment ability ・Achieves patterning with up to twice the resolution of the mask - Application fields include photonics, production of diffraction gratings for optical diffraction and spectroscopy, LED light extraction patterns, PSS (Patterned Sapphire Substrates), and research and development of color filters. ・75nm half pitch (L/S) can be achieved by selecting a DUV light source.

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    Nanopattern exposure equipment "PhableR 100

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1 Models of Nanopattern exposure equipment "PhableR 100

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Nanopattern exposure equipment "PhableR 100-Part Number-Nanopattern exposure equipment "PhableR 100

Nanopattern exposure equipment "PhableR 100

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About Company Handling This Product

Kyodo International, Inc.

Response Rate

100.0%

Response Time

70.3hrs

Company Overview

Kyodo International, Inc. established in 1970 and based in Kawasaki-shi, Japan, is a manufacturer and distribu...

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  • Japan

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Semiconductor Lithography Equipment
Semiconductor Lithography Equipment　Kyodo International, Inc.
Kyodo International, Inc.

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