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  3. Etching Equipment
  4. PEC process equipment PEC-6 (Sanmei Co., Ltd.)

PEC process equipment PEC-6
Sanmei Co., Ltd.

Sanmei Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

87.6hours

Company Review

5.0

About This Product

GaN wafer low damage etching equipment

■Light source wavelength

UVA UVC selectable

■Heating function

Fast and deep etching possible by heating the etching solution

■Autonomous driving

Etching rinse parameters can be set using touch panel input.

■Features

・From 10mm□ small chip to φ6 inch wafer ・GaN low damage etching possible ・Simple structure and low price

  • Product

    PEC process equipment PEC-6

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Last viewed: 7 hours ago

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1 Models of PEC process equipment PEC-6

Image Part Number Price (excluding tax) Adaptive work Chemical supply External dimensions Etching method UVC light source UVA light source

PEC-6

Available upon quote

□10mm small chip, φ2~6 inch

2 nozzle air compression method
Etching liquid, rinsing liquid

1,470 (H) ×650 (W) ×750 (D)

Photo-Electro Chemical:Photo-electrochemistry

Plasma light source 220~320nm 12mW/sm2 or more

Ultra-high pressure mercury lamp 315~400nm 15mW/sm2 or more

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About Company Handling This Product

Sanmei Co., Ltd.

Response Rate

100.0%

Response Time

87.6hrs

Company Review

5.0
  • Japan

Related search keywords

Etching Equipment
Etching Equipment　Sanmei Co., Ltd.
Sanmei Co., Ltd.

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