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  4. Surface Inspection Metrology of Nanofilms (SIMON) (Park Systems Japan Co., Ltd.)
Surface Inspection Metrology of Nanofilms (SIMON)-SIMON
Surface Inspection Metrology of Nanofilms (SIMON)-Park Systems Japan Co., Ltd.

Surface Inspection Metrology of Nanofilms (SIMON)
Park Systems Japan Co., Ltd.

Park Systems Japan Co., Ltd.'s Response Status

Response Rate

100.0%

Response Time

26.4hours

Relatively Fast Response

About This Product

SIMON is specially designed for regular measurement tasks in imaging ellipsometry. The simple user interface and robustness of the fixed-angle ellipsometer make imaging ellipsometry easy to use. Microscopy mode allows very fast visualization of changes and defects in extremely thin films (e.g. monolayers: d = 0.35 nm), while ellipsometry mode allows measuring the thickness and refractive index of the sample material. It's possible. Imaging ellipsometry itself combines the sensitivity of thickness and refractive index measurements with microscopic imaging. This makes it possible to judge changes in the thickness and refractive index of samples with fine structures using microscopic images. Typical applications include surface inspection of large samples for uniformity and defects in quality control, and fast detection of delamination flakes in 2D materials.

■Features

- Simple system that is easy to use even for beginners ・Imaging ellipsometry with improved ellipsometry position resolution to 1 µm ・Measurement of thickness and refractive index of microstructures ・High-speed visualization of large-area layer thickness distribution and hidden defects

  • Product

    Surface Inspection Metrology of Nanofilms (SIMON)

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1 Models of Surface Inspection Metrology of Nanofilms (SIMON)

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Surface Inspection Metrology of Nanofilms (SIMON)-Part Number-SIMON

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About Company Handling This Product

Park Systems Japan Co., Ltd.

Response Rate

100.0%

Response Time

26.4hrs

  • Japan

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