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  4. XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness (Bruker Corporation)
XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness-3DAFMQC3/QC-Velox
XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness-Bruker Corporation

XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness
Bruker Corporation

Bruker Corporation's Response Status

Response Rate

100.0%

Response Time

30.7hours

Relatively Fast Response

About This Product

■XRD equipment for quality control of compound semiconductors

The Bruker QC3/QC-Velox instrument is designed specifically as an industrial XRD instrument. The sample stage is placed flat, so there is no need to worry about the wafer falling, even if it is easily damaged. In addition, it is equipped with a wide XY stage that can map a 300mm wafer over the entire surface, so it is possible to perform batch processing using a holder that holds multiple wafers at the same time. By adopting a high-speed goniometer and a high-speed axis alignment algorithm, it boasts a high throughput that is incomparable to research XRD. The RADs software used for analysis is the fitting software most widely used at production sites.It is a powerful analysis software that can be customized so that analysis and reporting can be performed smoothly even at production sites where researchers cannot intervene. It's software. An automatic wafer transfer robot (optional) can be selected, and further labor savings on the production line can be expected. Engineers can spend more time on more important tasks other than evaluation. When the high-speed XRR channel (optional) is selected, the patented focusing optics enable XRR measurement and evaluation in seconds, making absolute film thickness measurements easy. When equipped with a high-speed one-dimensional detector (optional, QC-Velox-E), reciprocal map measurements that conventionally took several hours can be measured quickly (from tens of seconds to several minutes), making it possible to perform reciprocal map simulation and Fitting analysis can be provided.

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    XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness

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1 Models of XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness

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XRD device QC3 / QC-Velox for production control of compound semiconductor composition and film thickness-Part Number-3DAFMQC3/QC-Velox

3DAFMQC3/QC-Velox

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Bruker Corporation

Response Rate

100.0%

Response Time

30.7hrs

Company Overview

Bruker, founded in 1960 and based in Billerica, Massachusetts, is a manufacturer and distributor of scientific...

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Bruker Corporation

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