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Platform for DRIE applications PlasmaPro 100 Estrelas DRIE-PlasmaPro 100 Estrelas DRIE
Platform for DRIE applications PlasmaPro 100 Estrelas DRIE-Oxford Instruments Ltd.

Platform for DRIE applications PlasmaPro 100 Estrelas DRIE
Oxford Instruments Ltd.

Oxford Instruments Ltd.'s Response Status

Response Rate

100.0%

Response Time

26.3hours

Relatively Fast Response


About This Product

The PlasmaPro 100 Estrelas platform is designed for total flexibility for deep reactive ion etching (DRIE) applications. We can meet the diverse process requirements of the MEMS (Micro Electro Mechanical Systems), advanced packaging and nanotechnology markets. PlasmaPro 100 Estrelas offers ultimate flexibility with Bosch and cryogenic process compatibility.

■Features

・High selectivity using high-speed etching and Bosch process ・Process that enables smooth side walls ・High anisotropy (vertical direction) profile ・Low rate, low power (SOI) for nanosilicon etch and notch control ・Slanted via etching ・Wide range of application fields ・Mechanical or electrostatic clamp ・Excellent reproducibility ・Extension of mean cleaning interval time (MTBC)

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    Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

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1 Models of Platform for DRIE applications PlasmaPro 100 Estrelas DRIE

Image Part Number Price (excluding tax) Minimum etching rate/nm Side wall Profile Photoresist selectivity Cleaning Etching speed (μm/min) Aspect ratio ARDE (aspect ratio dependent etching) control
Platform for DRIE applications PlasmaPro 100 Estrelas DRIE-Part Number-PlasmaPro 100 Estrelas DRIE

PlasmaPro 100 Estrelas DRIE

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Bosch: ≈ 300
Cryogenic: ≈ 10
Mixed gas: 30

Bosch: coarse
Cryogenic: smooth
Mixed gas: smooth

Bosch: Vertical
Cryogenic: Vertical or tilted
Mixed gas: vertical or inclined

Bosch: very expensive
Cryogenic: high
Mixed gas: low

Bosch: Normal
Cryogenic: Almost unnecessary
Mixed gas: normal

Bosch: fast
Cryogenic: Intermediate
Mixed gas: low speed

Bosch: very expensive
Cryogenic: high
Mixed gas: low

Bosch: Compatible
Cryogenic: limited
Mixed gas: limited

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About Company Handling This Product

Response Rate

100.0%


Response Time

26.3hrs

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